Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing sales6@sinochem-nanjing.com
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LED Photoresist

    • Product Name LED Photoresist
    • Alias led_pr
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry sales6@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
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    Specifications

    HS Code

    717868

    Product Name LED Photoresist
    Type Photosensitive material
    Application LED fabrication
    Sensitivity Wavelength Near-UV to blue light
    Resolution High
    Coating Method Spin coating
    Developer Type Aqueous alkali
    Film Thickness 1-10 microns
    Bake Temperature 90-120°C
    Shelf Life 6-12 months
    Substrate Compatibility Sapphire, silicon, glass
    Exposure Energy 80-150 mJ/cm²
    Storage Conditions Cool, dark, dry place

    As an accredited LED Photoresist factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing The LED Photoresist is packaged in a 500ml amber glass bottle, securely sealed, and clearly labeled with handling instructions and safety warnings.
    Shipping LED photoresist should be shipped in tightly sealed, chemical-resistant containers to prevent contamination and leakage. It must be kept away from direct sunlight, heat, and moisture. Transport under ambient or recommended temperature conditions is necessary. Proper labeling, accompanying safety documentation, and compliance with local chemical shipping regulations are required.
    Storage LED Photoresist should be stored in a cool, dry, and well-ventilated area away from direct sunlight and sources of heat or ignition. Keep the container tightly closed and avoid exposure to moisture and incompatible substances. Storage temperature should generally be between 5–25°C (41–77°F). Always consult the manufacturer's safety data sheet for specific storage requirements and safety precautions.
    Application of LED Photoresist

    Applications of LED Photoresist in Industrial Manufacturing

    Our LED photoresist plays a pivotal role in multiple advanced manufacturing processes where photolithographic precision and material compatibility are essential. As an upstream manufacturer, we ensure true industrial compliance, reliable formulation ratios, and process-ready integration for demanding downstream applications.

    1. LED Chip Fabrication

    Semiconductor manufacturers use this photoresist in the photolithography steps for creating patterned layers on sapphire or silicon substrates during LED chip production. Our product delivers high resolution and stability under deep UV LED exposure, minimizing pattern defects and supporting mass transfer techniques. Close collaboration with downstream partners enables optimization for micro-patterning and critical dimension uniformity.

    Industry compliance standards

    • IPC-6012 (Performance Specification for Rigid Printed Boards)
    • JEDEC JESD22 (Reliability Test Methods for Semiconductor Devices)
    • RoHS Directive 2011/65/EU for hazardous substances control
    • ISO 9001:2015 for quality management

    Typical usage ratio

    • Applied as a spin-coated film from 1 μm to 3 μm thickness, selected according to target pattern resolution and substrate topography.
    • Solid content in coatings typically ranges from 15% to 22% by weight, depending on design geometry and etching requirements.

    Downstream process integration

    • Deployed on pre-cleaned substrate wafers after surface preparation.
    • Patterned via UV exposure through advanced photomasks; development and hard baking before etching or lift-off.
    • Utilized in micro-LED transfer and flip-chip assembly during die-level packaging.

    Final product types

    • High-performance blue, green, red, and white LED chips
    • Micro-LED arrays for display backplanes
    • Power LED dice for automotive, medical, and general lighting

    2. Display Panel Manufacture (Mini-LED and Micro-LED)

    Major display integrators require reliable photoresist for the fine-pitch alignment and patterning involved in mini-LED and micro-LED array assembly, including active matrix substrates. Our photoresist provides high aspect ratio structures and excellent adhesion to IGZO or poly-Si TFT layers, supporting mass transfer and repair yield rates in large panel production.

    Industry compliance standards

    • IPC-6016 (High Density Interconnect Printed Boards)
    • IEC 62341 for OLED and LED display safety and performance
    • China National Standard GB/T 31465 for flat panel display materials
    • ISO 14001:2015 environmental management

    Typical usage ratio

    • Film thickness of 1.0–2.2 μm, depending on transfer technique and column pitch.
    • Formulated with photoactive content between 14%–20% by weight, adjustable according to mask configuration and thermal budget.

    Downstream process integration

    • Spin or spray coated onto TFT backplane or transfer carrier substrate.
    • Processed in mask aligners for tight registration between RGB subpixels and micro LEDs.
    • Developed and etched to define solder barrier frames and transfer fiducials before die attachment.

    Final product types

    • Micro-LED TV modules (4K/8K)
    • Miniturized automotive instrument clusters
    • High-brightness information signage panels
    • Wearable device displays

    3. LED Packaging Substrate Production

    In the fabrication of ceramic and organic substrates for LED module assembly, downstream circuit substrate manufacturers rely on our photoresist for fine-pitch circuit patterning, via hole formation, and solder resist layers. The material’s compatibility with low-thermal-expansion supports enables precise circuit registration in high-density interposer builds, facilitating improved module heat management.

    Industry compliance standards

    • IPC-6012DS for High Reliability LED Applications
    • UL 796 (Standard for Printed-Wiring Boards)
    • EN 60335-1 (Household and Similar Electrical Appliances – Safety)
    • REACH (EC 1907/2006) for substance registration

    Typical usage ratio

    • Applied in layers 8–20 μm thick for solder mask; 5–12 μm for inner-layer circuit imaging.
    • Resist concentration in working solution from 12% up to 18%, set by pattern resolution targets and plating current density.

    Downstream process integration

    • Coated after copper cladding and drilling to define tracks, pads, and conductor windows.
    • Processed through stepper or direct imaging, followed by development and permanent plating or solder mask curing.
    • Reticulated as part of embedded component cavity definition in advanced package-on-board flow.

    Final product types

    • Metal-core PCB for high-power LEDs
    • Ceramic hybrid substrates for COB modules
    • Flexible polyimide circuits for miniaturized module design
    • Fine-pitch leadframes for chip-scale LED packages

    4. LED Optical Component Manufacturing (Diffusers & Lenses)

    Optoelectronic component producers adopt this photoresist in the micro-patterning of polymer or glass substrates used for LED lens arrays, light guides, and beam homogenizers. High-resolution fidelity and solvent resistance make it suitable for advanced nanoimprint and sub-micron texturing processes required for optical diffusion and directionality control in high-performance lighting applications.

    Industry compliance standards

    • ISO 10110-7 (Preparation of drawings for optical elements and systems)
    • ANSI Z80.1 (Ophthalmics – Spectacle Lenses)
    • RoHS 3 and WEEE for environmental compliance
    • ISO 13485 for medical LED optics (where applicable)

    Typical usage ratio

    • Layer thicknesses of 0.8–2.5 μm, depending on required texture depth and microstructure height.
    • Photoactive constituent content remains between 12%–17% by weight to ensure fine line and space uniformity without film cracking.

    Downstream process integration

    • Applied by spin or slot-die coating onto pre-cleaned polymer or float glass panels.
    • Patterned using advanced projection UV systems or e-beam writers for master stamp preparation or direct replica manufacturing.
    • Pattern transfer by reactive ion etching or imprint lithography using resist as etch mask.

    Final product types

    • Micro-lens arrays for LED matrix headlamps
    • Diffuser sheets for edge-lit backlighting panels
    • 3D light-guides for architectural lighting
    • Condenser and collimator lenses in specialty optics
    Free Quote

    Competitive LED Photoresist prices that fit your budget—flexible terms and customized quotes for every order.

    For samples, pricing, or more information, please call us at +8618018036652 or mail to sales6@sinochem-nanjing.com.

    We will respond to you as soon as possible.

    Tel: +8618018036652

    Email: sales6@sinochem-nanjing.com

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