Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing sales6@sinochem-nanjing.com
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1,1,1,2,3,3,3-heptafluoro-2-methoxypropane

    • Product Name 1,1,1,2,3,3,3-heptafluoro-2-methoxypropane
    • Alias Sevoflurane
    • Einecs 468-740-2
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry sales6@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
    VTB
    Specifications

    HS Code

    224990

    Chemical Name 1,1,1,2,3,3,3-heptafluoro-2-methoxypropane
    Molecular Formula C4H3F7O
    Molecular Weight 214.06 g/mol
    Cas Number 120431-57-4
    Appearance Colorless liquid
    Boiling Point 43-45 °C
    Melting Point -83 °C
    Density 1.489 g/cm³
    Refractive Index 1.278
    Solubility In Water Insoluble
    Vapor Pressure 585 mmHg at 20 °C

    As an accredited 1,1,1,2,3,3,3-heptafluoro-2-methoxypropane factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing A 250 mL amber glass bottle with a secure PTFE-lined cap, labeled clearly with chemical name, hazard symbols, and manufacturer details.
    Shipping **Shipping Description for 1,1,1,2,3,3,3-Heptafluoro-2-methoxypropane:** Ship as a hazardous chemical under UN 3163, "Liquefied gas, n.o.s.," Class 2.2 (non-flammable compressed gas). Use approved gas cylinders. Ensure proper labeling and documentation. Store and transport in cool, well-ventilated areas, away from incompatible materials. Follow all local, national, and international regulations.
    Storage **1,1,1,2,3,3,3-Heptafluoro-2-methoxypropane** should be stored in a tightly closed container, in a cool, dry, and well-ventilated area away from heat, sparks, open flames, and incompatible substances such as strong oxidizers. Protect from moisture and direct sunlight. Ensure adequate ventilation to prevent vapor accumulation. Store at recommended temperatures and follow all relevant safety guidelines and regulations.
    Application of 1,1,1,2,3,3,3-heptafluoro-2-methoxypropane

    Applications of 1,1,1,2,3,3,3-heptafluoro-2-methoxypropane in Industrial Manufacturing

    1,1,1,2,3,3,3-heptafluoro-2-methoxypropane serves distinct roles in multiple advanced manufacturing domains, where its chemical characteristics address defined needs in specialized downstream formulations. The applications outlined below reflect established industry practices based on decades of raw material expertise and validated use cases within regulated sectors.

    1. Electronic Semiconductor Cleaning

    Within semiconductor wafer fabrication, this compound functions as a non-flammable precision cleaning solvent for post-etch and post-resist strip residue removal. Its high volatility and compatibility with delicate microelectronic materials improve cleaning efficiency in advanced node manufacturing, while minimizing ionic contamination and device yield loss. In fabs, careful control of solvent loading and rinse cycles is crucial to align with strict trace organic residue requirements, as dictated by major electronics industry standards.

    Industry compliance standards

    • SEMI S2: Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment
    • ICMI (International Council on Materials Industry) Cleanroom Solvent Protocols
    • JEITA ETR-7012A: Requirements for Electronic Grade Solvents
    • ISO 14644-1: Cleanroom and Associated Controlled Environments—Classification of Air Cleanliness

    Typical usage ratio

    • Solvent concentrations typically range from 10% to 60% v/v in co-blended cleaning systems, adjusted to the process node and resist chemistry; higher use for advanced nodes ≤5nm

    Downstream process integration

    • Introduced at physical vapor deposition (PVD) or chemical vapor deposition (CVD) tool cleaning stations as a dedicated bath component or spray rinse; also used in single-wafer and batch immersion cleaning modules after etch or strip steps

    Final product types

    • High-performance logic and memory wafers
    • System-on-a-chip (SoC), DRAM and NAND devices
    • Photomask substrates

    2. Medical Device Manufacturing (Flushing and Drying Agents)

    Medical device OEMs integrate this material during post-assembly instrument cleansing and rapid drying protocols, particularly for high precision components such as catheters and endoscopic assemblies. Its low surface tension enables penetration into fine lumens and complex geometries, ensuring consistent removal of organic residues prior to sterilization, fulfilling requirements for cytotoxicity control and patient safety. Material safety data, including biocompatibility profiles and residue analytics, are key to risk management and validation procedures in this sector.

    Industry compliance standards

    • ISO 10993-1: Biological Evaluation of Medical Devices
    • 21 CFR 820: FDA Quality System Regulation (QSR) for Medical Devices
    • IEC 60601-1: Safety Requirements for Medical Electrical Equipment (applies to cleaning solvents as process auxiliaries)
    • EN ISO 13485: Medical Devices – Quality Management Systems

    Typical usage ratio

    • Formulated at 5–20% v/v for flushing and <3% for final rinsing in automated cleaning stations; ratio subject to extraction study outcomes and QMS validation batches

    Downstream process integration

    • Employed following ultrasonic or mechanical aqueous wash steps, directly in automated flush/dry cycles, prior to EO or gamma sterilization; may be recaptured via solvent recovery systems for closed-loop use

    Final product types

    • Interventional catheters, guidewires, stent delivery systems
    • Endoscopy and minimally invasive surgical toolsets
    • Implantable electronic device housings

    3. Precision Optics Manufacturing (Cleaning and Surface Treatment)

    The fluorinated ether structure provides a unique cleaning profile for high-value optical glass, IR windows, and laser device substrates produced for defense, scientific, and industrial instrumentation. It removes submicron particulates and nonpolar organic films without leaving detectable residue or interfering with optical coatings. Strict batch tracking and purity documentation support ongoing compliance audits, while surface finishing parameters demand meticulous adjustment of solvent blend ratios by production chemists.

    Industry compliance standards

    • MIL-C-14806A: Military Specification for Cleaning Compounds – Optical Glass
    • ISO 9211-1: Optical coatings on ophthalmic optics
    • DIN ISO 10110: Preparation of Drawings for Optical Elements and Systems
    • RoHS Directive 2011/65/EU (Restriction of Hazardous Substances)

    Typical usage ratio

    • Applied at 1–15% v/v, concentration tailored to incoming glass particulates and polishing compound residue loads; titrated per batch to minimize solvent consumption and maximize cleaning yield

    Downstream process integration

    • Used post-grinding and pre-coating in laminar flow cleaning cabinets; serves in both immersion and vapor degreasing tanks as a final rinse before AR (anti-reflective) or filter coating layers are deposited

    Final product types

    • Laser resonator optics and beam delivery windows
    • Infrared imaging modules
    • Precision telescopic lenses for scientific equipment

    4. Aerospace Hydraulic and Fuel System Flushing

    Aerospace OEMs rely on this material for flushing precision-engineered fuel and hydraulic lines during assembly and end-of-line qualification, due to its effective removal of light greases, assembly oil residues, and machining particulates. Non-flammability and low residue make it suitable for both metallic and polymeric system components, particularly in situations where rapid drying and material compatibility are mission critical and routinely validated against aerospace cleanliness requirements.

    Industry compliance standards

    • AMS 1526C: Cleaning Compounds, Aircraft Surface
    • Boeing BAC 5750: Cleaning Process Specification for Aircraft Components
    • AS9100D: Quality Management Systems – Aerospace
    • SAE AS6228: Aerospace Maintenance Chemicals

    Typical usage ratio

    • Flushing formulations typically use 8–30% v/v depending on tube diameter and contaminant type; pilot-scale flushing tests establish minimum required concentrations for full residue removal

    Downstream process integration

    • Integrated during hydraulic and fuel manifold assembly, applied at the final cleaning and drying stage before pressure/leak testing and system packaging for delivery to aerospace integrators

    Final product types

    • Commercial and defense aircraft hydraulic lines
    • Spacecraft propellant and attitude control lines
    • Helicopter and UAV fuel delivery assemblies
    Free Quote

    Competitive 1,1,1,2,3,3,3-heptafluoro-2-methoxypropane prices that fit your budget—flexible terms and customized quotes for every order.

    For samples, pricing, or more information, please call us at +8618018036652 or mail to sales6@sinochem-nanjing.com.

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    Email: sales6@sinochem-nanjing.com

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