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HS Code |
319295 |
| Chemicalname | Tetramethylammonium Hydroxide |
| Chemicalformula | C4H13NO |
| Casnumber | 75-59-2 |
| Molarmass | 91.15 g/mol |
| Appearance | Colorless to pale yellow solution |
| Odor | Ammonia-like |
| Density | 1.015 g/cm³ (25°C, 25% w/w solution) |
| Boilingpoint | 100°C (as aqueous solution) |
| Solubilityinwater | Completely miscible |
| Ph | Strongly alkaline (typically >13 in aqueous solution) |
| Flashpoint | Non-flammable (aqueous solution) |
| Stability | Stable under recommended storage conditions |
As an accredited Tetramethylammonium Hydroxide factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Tetramethylammonium Hydroxide is packaged in a 500 mL amber glass bottle with a secure, leak-resistant plastic screw cap. |
| Shipping | Tetramethylammonium Hydroxide is shipped in tightly sealed, corrosion-resistant containers, typically plastic or glass, to prevent leakage and moisture absorption. Packages are clearly labeled as corrosive and toxic, with secure packaging to avoid spillage. Transport follows strict regulations for hazardous chemicals, ensuring secure handling and compliance with safety and environmental guidelines. |
| Storage | Tetramethylammonium Hydroxide should be stored in a tightly closed, corrosion-resistant container, in a cool, dry, well-ventilated area away from incompatible substances such as acids and oxidizers. It should be protected from moisture and direct sunlight, and kept at room temperature. Personal protective equipment should be used when handling, and storage areas should have suitable spill containment and safety signage. |
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Purity 25%: Tetramethylammonium Hydroxide purity 25% is used in semiconductor photoresist developing, where it enables precise resolution and high pattern fidelity. Aqueous Solution: Tetramethylammonium Hydroxide aqueous solution is used in anisotropic silicon etching, where it provides controlled and uniform etch rates. Stability Temperature 30°C: Tetramethylammonium Hydroxide stability temperature 30°C is used in microelectromechanical systems (MEMS) fabrication, where it maintains consistent process stability. pH 13.5: Tetramethylammonium Hydroxide pH 13.5 is used in cleaning of thin film transistors, where it ensures efficient removal of organic residues. Low Metal Content <5 ppb: Tetramethylammonium Hydroxide low metal content <5 ppb is used in integrated circuit manufacturing, where it minimizes contamination and improves device reliability. Concentration 2.38%: Tetramethylammonium Hydroxide concentration 2.38% is used in liquid crystal display (LCD) substrate processing, where it ensures optimal substrate clarity and uniformity. Viscosity 1.1 mPa·s: Tetramethylammonium Hydroxide viscosity 1.1 mPa·s is used in precision chemical synthesis, where it allows enhanced mixing and reaction control. Particle Size <10 nm: Tetramethylammonium Hydroxide particle size <10 nm is used in nanomaterial dispersion processes, where it achieves uniform dispersion and improved product homogeneity. |
Competitive Tetramethylammonium Hydroxide prices that fit your budget—flexible terms and customized quotes for every order.
For samples, pricing, or more information, please call us at +8615371019725 or mail to admin@sinochem-nanjing.com.
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Tel: +8615371019725
Email: admin@sinochem-nanjing.com
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