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HS Code |
914911 |
| Chemical Name | Nonamethyltrisilazane |
| Molecular Formula | C9H27N3Si3 |
| Molecular Weight | 261.61 g/mol |
| Cas Number | 107-90-4 |
| Appearance | Colorless liquid |
| Boiling Point | 224-225 °C |
| Density | 0.845 g/mL at 25 °C |
| Refractive Index | 1.434 |
| Flash Point | 95 °C (closed cup) |
| Solubility | Reacts with water |
As an accredited Nonamethyltrisilazane factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | 500 mL amber glass bottle, securely sealed, chemical-resistant cap, clear hazard labeling, supplied by Sigma-Aldrich, for laboratory use. |
| Shipping | Nonamethyltrisilazane should be shipped in tightly sealed containers under a dry, inert atmosphere to prevent contact with moisture. It is classified as a flammable liquid and may be regulated as a hazardous material. Proper labeling and documentation are required, and transport must comply with applicable regulations, such as UN1993 (flammable liquids, n.o.s.). |
| Storage | Nonamethyltrisilazane should be stored in a tightly sealed container under an inert atmosphere, such as nitrogen or argon, to prevent moisture and air exposure. Keep the storage area cool, dry, and well-ventilated, away from heat sources, open flames, and incompatible substances like oxidizing agents. Ensure proper labeling and access only to trained personnel. Avoid contact with water, as it is moisture-sensitive. |
Applications of Nonamethyltrisilazane in Industrial ManufacturingNonamethyltrisilazane serves as a highly specialized silazane compound, supporting efficient processes across silicon-based material sectors. With unique reactivity and controlled volatility, it fits advanced industrial needs where stringent technical and regulatory requirements must be met. Below, we present verified downstream application scenarios with extensive operational detail based on manufacturer experience. 1. Semiconductor Surface Passivation and Photoresist ProcessingMajor semiconductor device manufacturers use nonamethyltrisilazane for wafer priming immediately before photoresist application. It acts as a surface treatment agent, converting hydrophilic silicon dioxide wafer surfaces into hydrophobic states to boost resist adhesion and pattern fidelity. Inline vapor-phase priming occurs in automated spin-coating clusters, ensuring uniformity and minimizing process-induced defects even on advanced node substrates. Quality teams routinely verify surface energy parameters and ex situ static contact angles post-priming for defectivity control. Industry compliance standards
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2. Silylation Reagent for Chromatography DerivatizationAnalytical laboratories and reference standards producers deploy this reagent for silylation of hydroxyl, carboxyl, and amino functional groups in organic and biological samples prior to GC and LC analysis. Labs incorporate nonamethyltrisilazane into sample preparation to provide thermally stable, highly volatile silyl derivatives, ensuring accurate quantitation of low-abundance analytes across environmental, pharmaceutical, and food safety testing. Automated robotic sample preparation systems and validated batch controls drive reproducibility between test runs. Industry compliance standards
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3. Siloxane Synthesis Modifier in Advanced Silicone Elastomer ProductionProducers of RTV (room temperature vulcanized) and LSR (liquid silicone rubber) grades utilize nonamethyltrisilazane as a chain-capping agent or hydrophobizing additive to modify siloxane backbone length and end-group composition. Careful control of additive concentration during polymerization tunes mechanical flexibility, surface energy, and crosslink density for custom gaskets, moldmaking compounds, and encapsulants in automotive and medical applications. Each production lot undergoes IR and GPC confirmation to verify end-group conversion efficiency. Industry compliance standards
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4. Hydrophobic Surface Treatment in Electronic Encapsulation CompoundsManufacturers of potting and conformal coating materials for electronics employ nonamethyltrisilazane as a hydrophobicity enhancer during the formulation of two-component urethane and epoxy systems. The additive reduces surface polarity, improving water repellency and electrical insulation resistance post-curing. Production protocols specify pre-mix dispersion under vacuum to minimize microvoid formation and optimize final resin film properties. Ongoing oven-aging and dielectric breakdown testing verify performance under real-world operating conditions. Industry compliance standards
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5. Crosslink Density Modifier in High-Performance Paint and Coating FormulationPaint and specialty coating manufacturers add nonamethyltrisilazane into silicone-modified resin systems, targeting improved crosslink density and long-term weatherability in architectural and industrial coatings. The agent reacts with active silica or hydroxyl groups in the binder, introducing hydrophobic trimethylsilyl surface functionality for superior rain erosion resistance and anti-graffiti performance. Plant operators monitor rheology and crosslink conversion via shear and IR tests at multiple batch points to align with customer-specific surface gloss and outdoor durability parameters. Industry compliance standards
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