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Copper(II) Trifluoromethanesulfonate

    • Product Name Copper(II) Trifluoromethanesulfonate
    • Alias copper(II) triflate
    • Einecs 213-029-8
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry admin@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
    VTB
    Specifications

    HS Code

    417849

    Chemicalname Copper(II) Trifluoromethanesulfonate
    Commonname Copper(II) Triflate
    Chemicalformula Cu(OSO2CF3)2
    Casnumber 34946-82-2
    Molarmass 361.66 g/mol
    Appearance Blue-green solid
    Solubilityinwater Soluble
    Meltingpoint 129 °C (decomposes)
    Density 2.56 g/cm3
    Odor Odorless
    Purity Typically >98%
    Coordinationgeometry Octahedral
    Storageconditions Store in a cool, dry place; keep container tightly closed
    Reactivity Strong oxidizing agent
    Hygroscopic Yes

    As an accredited Copper(II) Trifluoromethanesulfonate factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Sealed amber glass bottle, labeled "Copper(II) Trifluoromethanesulfonate, 25g," featuring hazard symbols and batch information for laboratory use.
    Shipping Copper(II) Trifluoromethanesulfonate is shipped in tightly sealed, chemical-resistant containers to prevent moisture exposure and leakage. It is classified as a hazardous material and is handled and transported in accordance with local and international regulations. Proper labeling and documentation accompany shipments to ensure safe handling and storage upon arrival.
    Storage Copper(II) trifluoromethanesulfonate should be stored in a tightly sealed container, in a cool, dry, and well-ventilated area, away from moisture and incompatible materials such as strong reducing agents. Protect from light and humidity to prevent decomposition. Label containers appropriately, and keep them away from heat sources or open flames. Always follow standard laboratory safety protocols during storage and handling.
    Application of Copper(II) Trifluoromethanesulfonate

    Applications of Copper(II) Trifluoromethanesulfonate in Industrial Manufacturing

    Copper(II) Trifluoromethanesulfonate is widely utilized in select high-value industrial sectors, where its catalytic and functional properties directly enhance downstream process reliability and finished product consistency. As the original manufacturer, we supply this specialty raw material for well-defined, regulation-driven markets, supporting precise technical requirements throughout customer operations.

    1. Fine Chemical Synthesis: Catalysis in Cross-Coupling Reactions

    Professional fine chemical producers rely on this copper complex as a homogenous catalyst, particularly for C-N and C-O cross-coupling reactions, including Ullmann-type condensations. Its high solubility in organic solvents and reliable activity enable efficient coupling under moderate conditions, reducing by-product contamination in downstream intermediates and active pharmaceutical ingredient (API) precursors. Processing facilities strictly control catalyst concentration and monitor residual metal levels in the output specification.

    Industry compliance standards

    • ICH Q3D (Elemental Impurities)
    • EPA 40 CFR Part 439 (Pharmaceutical Manufacturing Effluent Guidelines)
    • REACH Annex XVII (Restriction of Substances)
    • ISO 9001:2015 Quality Management Systems

    Typical usage ratio

    • 0.5 mol% to 5 mol% relative to limiting substrate; chemists adjust based on substrate reactivity, target yield, and post-processing purification steps.

    Downstream process integration

    • Chemical engineers add the copper salt at the batch or continuous reactor charge stage, followed by organic solvent and ligands; removal involves aqueous workup and metal scavenging in late-stage processing.

    Final product types

    • Pharmaceutical intermediates
    • Electronic grade fine chemicals
    • Agrochemical API precursors
    • Specialty monomers

    2. Functional Polymer Modification

    Polymer manufacturers employ Copper(II) Trifluoromethanesulfonate as a Lewis acid catalyst to initiate ring-opening polymerizations and to catalyze end-group functionalization on specialty polyethers and polyesters. This enables precise modification of polymer backbone architectures resulting in materials with tailored dielectric, thermal, or adhesion properties, especially for electronic encapsulants and coatings. Strict control of residual metals ensures compliance with electronic device reliability demands.

    Industry compliance standards

    • RoHS Directive 2011/65/EU (Restriction of Hazardous Substances)
    • IEC 61249-2-21 (Halogen-free Laminate Requirements)
    • UL 94 (Flame Class for Plastics)
    • ISO 14001 (Environmental Management Systems)

    Typical usage ratio

    • 0.1%-1% by weight relative to the monomer or polymer feedstock; optimizations are based on desired functional group integration and removal efficiencies in subsequent steps.

    Downstream process integration

    • The copper salt is dispersed into the polymer melt or solution prior to polymerization or end-group modification; downstream washing and filtration remove residual ions before extrusion or film casting.

    Final product types

    • High-performance electronics encapsulant resins
    • Dielectric coatings for circuit boards
    • Low-dielectric films and foams
    • Functionalized adhesives

    3. Organic Electro-Synthesis Intermediates

    Specialty electrochemical processors apply Copper(II) Trifluoromethanesulfonate as a supporting electrolyte and mediator in controlled potential organic oxidations and selective arylation. Its stable copper ion facilitates uniform electron transfer, improving product selectivity and current efficiency. Continuous monitoring of electrochemical parameters and copper balance maintains consistent operation and minimizes waste handling complexity.

    Industry compliance standards

    • ISO 13485 (Quality Management for Device Intermediates)
    • OSHA 29 CFR 1910.1200 (Hazard Communication Standard)
    • REACH Registration for Organometallic Compounds
    • GMP guidelines for advanced intermediates (where applicable)

    Typical usage ratio

    • 0.2%-2% by weight in electrolyte solution, selected based on desired current density and target conversion; electrolyte composition may be increased for substrate solubility adaptation.

    Downstream process integration

    • Copper salt dissolves in organic solvent-electrolyte matrix within flow or batch electrolyzers; after reaction, the mixture proceeds through work-up and intermediate purification units to recover product and minimize copper content in effluent streams.

    Final product types

    • Electrosynthetic fine chemical intermediates
    • Custom arylated compounds
    • Oxidized aromatic precursors
    • Functional monomers for specialty polymers

    4. Electronic Packaging and Advanced PCB Manufacturing

    Producers of high-layer-count PCBs and microelectronic substrate packages utilize this copper salt for seed layer metallization, facilitated electroless copper deposition, and microvia filling in next-generation interconnect structures. Its non-halogen and non-chloride characteristics allow precision control of bath chemistry, supporting reduced ionic contamination and improved bond line conductivity critical for HDI and IC substrate applications.

    Industry compliance standards

    • IPC-6012E (Qualification and Performance of Rigid Printed Boards)
    • JESD625B (Handling of Electrostatic Discharge Sensitive Devices)
    • IEC 60194-1 (Printed Board Design Terminology and Requirements)
    • RoHS and REACH conformance for finished boards

    Typical usage ratio

    • 100–500ppm Cu2+ in plating and activation solutions; engineers optimize concentrations to balance grain structure and minimize surface roughness for laser-drilled microvias and sequential lamination lines.

    Downstream process integration

    • Operators introduce copper(II) salt into electroless plating baths following desmear stage or onto activated polyimide; precise metering controls copper ion delivery ahead of subsequent copper build-up and patterning operations.

    Final product types

    • HDI printed circuit boards
    • IC substrates and microvia interposer layers
    • SAP and mSAP high-density wiring
    • High-frequency RF boards for 5G modules
    Free Quote

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