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HS Code |
417849 |
| Chemicalname | Copper(II) Trifluoromethanesulfonate |
| Commonname | Copper(II) Triflate |
| Chemicalformula | Cu(OSO2CF3)2 |
| Casnumber | 34946-82-2 |
| Molarmass | 361.66 g/mol |
| Appearance | Blue-green solid |
| Solubilityinwater | Soluble |
| Meltingpoint | 129 °C (decomposes) |
| Density | 2.56 g/cm3 |
| Odor | Odorless |
| Purity | Typically >98% |
| Coordinationgeometry | Octahedral |
| Storageconditions | Store in a cool, dry place; keep container tightly closed |
| Reactivity | Strong oxidizing agent |
| Hygroscopic | Yes |
As an accredited Copper(II) Trifluoromethanesulfonate factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Sealed amber glass bottle, labeled "Copper(II) Trifluoromethanesulfonate, 25g," featuring hazard symbols and batch information for laboratory use. |
| Shipping | Copper(II) Trifluoromethanesulfonate is shipped in tightly sealed, chemical-resistant containers to prevent moisture exposure and leakage. It is classified as a hazardous material and is handled and transported in accordance with local and international regulations. Proper labeling and documentation accompany shipments to ensure safe handling and storage upon arrival. |
| Storage | Copper(II) trifluoromethanesulfonate should be stored in a tightly sealed container, in a cool, dry, and well-ventilated area, away from moisture and incompatible materials such as strong reducing agents. Protect from light and humidity to prevent decomposition. Label containers appropriately, and keep them away from heat sources or open flames. Always follow standard laboratory safety protocols during storage and handling. |
Applications of Copper(II) Trifluoromethanesulfonate in Industrial ManufacturingCopper(II) Trifluoromethanesulfonate is widely utilized in select high-value industrial sectors, where its catalytic and functional properties directly enhance downstream process reliability and finished product consistency. As the original manufacturer, we supply this specialty raw material for well-defined, regulation-driven markets, supporting precise technical requirements throughout customer operations. 1. Fine Chemical Synthesis: Catalysis in Cross-Coupling ReactionsProfessional fine chemical producers rely on this copper complex as a homogenous catalyst, particularly for C-N and C-O cross-coupling reactions, including Ullmann-type condensations. Its high solubility in organic solvents and reliable activity enable efficient coupling under moderate conditions, reducing by-product contamination in downstream intermediates and active pharmaceutical ingredient (API) precursors. Processing facilities strictly control catalyst concentration and monitor residual metal levels in the output specification. Industry compliance standards
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2. Functional Polymer ModificationPolymer manufacturers employ Copper(II) Trifluoromethanesulfonate as a Lewis acid catalyst to initiate ring-opening polymerizations and to catalyze end-group functionalization on specialty polyethers and polyesters. This enables precise modification of polymer backbone architectures resulting in materials with tailored dielectric, thermal, or adhesion properties, especially for electronic encapsulants and coatings. Strict control of residual metals ensures compliance with electronic device reliability demands. Industry compliance standards
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3. Organic Electro-Synthesis IntermediatesSpecialty electrochemical processors apply Copper(II) Trifluoromethanesulfonate as a supporting electrolyte and mediator in controlled potential organic oxidations and selective arylation. Its stable copper ion facilitates uniform electron transfer, improving product selectivity and current efficiency. Continuous monitoring of electrochemical parameters and copper balance maintains consistent operation and minimizes waste handling complexity. Industry compliance standards
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4. Electronic Packaging and Advanced PCB ManufacturingProducers of high-layer-count PCBs and microelectronic substrate packages utilize this copper salt for seed layer metallization, facilitated electroless copper deposition, and microvia filling in next-generation interconnect structures. Its non-halogen and non-chloride characteristics allow precision control of bath chemistry, supporting reduced ionic contamination and improved bond line conductivity critical for HDI and IC substrate applications. Industry compliance standards
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