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HS Code |
945195 |
| Product Name | 4-Chloro-3-Nitrobenzyl Alcohol |
| Cas Number | 231282-03-2 |
| Molecular Formula | C7H6ClNO3 |
| Molecular Weight | 187.58 g/mol |
| Appearance | Yellow solid |
| Melting Point | 77-81°C |
| Purity | Typically ≥98% |
| Solubility | Soluble in organic solvents (e.g. DMSO, methanol) |
| Synonyms | 4-Chloro-3-nitrobenzyl alcohol; 1-(4-chloro-3-nitrophenyl)methanol |
| Smiles | C1=CC(=C(C=C1CO)[N+](=O)[O-])Cl |
| Inchi | InChI=1S/C7H6ClNO3/c8-6-2-1-5(4-10)7(3-6)9(11)12/h1-3,10H,4H2 |
| Storage Temperature | Room temperature, tightly closed |
As an accredited 4-Chloro-3-Nitrobenzyl Alcohol factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | The 25g amber glass bottle features a white screw cap, clear labeling with hazard symbols, product name, and batch details. |
| Shipping | 4-Chloro-3-nitrobenzyl alcohol is shipped in secure, airtight containers to prevent leaks and contamination. It must be handled with care, following all local, national, and international regulations for hazardous chemicals. The package includes appropriate hazard labeling, documentation, and safety data sheets to ensure safe and compliant transportation. |
| Storage | Store 4-Chloro-3-nitrobenzyl alcohol in a tightly sealed container, in a cool, dry, and well-ventilated area away from direct sunlight, heat sources, and incompatible substances such as strong oxidizers or bases. Ensure proper chemical labeling. Avoid exposure to moisture and store at room temperature, unless otherwise specified by the manufacturer. Follow all institutional and regulatory safety guidelines for hazardous chemicals. |
Applications of 4-Chloro-3-Nitrobenzyl Alcohol in Industrial ManufacturingAs a dedicated manufacturer of 4-Chloro-3-Nitrobenzyl Alcohol, we support specialized industrial customers in high-value segments that rely on this intermediate. Below, we detail its principal downstream application sectors, noting compliance protocols, process flow, concentration guidance, and end-product types as seen in commercial-scale production. 1. Pharmaceutical Intermediate for CNS Active CompoundsPharmaceutical manufacturers use this compound in synthetic routes for select central nervous system (CNS) APIs, serving specifically in steps where controlled benzyl protection and functional group transformation are required. The alcohol derivative is introduced during multi-stage synthesis, supporting regioselective transformations and facilitating purification, while requiring strict traceability and QA oversight. Our customers run validated procedures with full batch documentation to support global regulatory filings. Industry compliance standards
Typical usage ratio
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2. Agrochemical Synthesis: Selective Herbicide PrecursorsMajor agrochemical processors employ this raw material in multi-step herbicide synthesis, particularly where selective aromatic substitution yields target molecules with specific weed control activity. The compound acts as a functional handle in early-stage condensation or alkylation, supporting specificity in structure–activity relationships, with full trace impurity and residual solvent profiling demanded by global MRLs. Industry compliance standards
Typical usage ratio
Downstream process integration
Final product types
3. Specialty Dye and Pigment ManufacturingThis intermediate serves as a precursor in the production of select yellow and orange azo dyes and pigment molecules, where specific electron-donating and -withdrawing substituents on the aromatic ring deliver enhanced lightfastness or heat stability. Leading dye houses integrate it during diazotization or coupling reactions, demanding tight control of reaction completeness and color development aligned to global textile and ink standards. Industry compliance standards
Typical usage ratio
Downstream process integration
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4. Electronic Chemicals: Photoresist Resin SynthesisWithin specialty electronics manufacture, downstream partners integrate this aromatic intermediate in the synthesis of negative-tone photoresist resins. Its substituent pattern improves UV-absorption characteristics and contributes to resolution control at sub-micron etching nodes. Its performance drives demand for precise lot-to-lot purity and narrow impurity profiles, key to achieving specified critical dimension control in semiconductor fabrication environments. Industry compliance standards
Typical usage ratio
Downstream process integration
Final product types
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