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2H-1,2,3-Triazole,4-Nitro-(9Ci)

    • Product Name 2H-1,2,3-Triazole,4-Nitro-(9Ci)
    • Alias 4-Nitro-1H-1,2,3-triazole
    • Einecs 221-838-2
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry admin@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
    VTB
    Specifications

    HS Code

    735251

    Iupac Name 4-nitro-2H-1,2,3-triazole
    Cas Number 68698-75-9
    Molecular Formula C2H2N4O2
    Molecular Weight 114.06
    Appearance Light yellow powder
    Melting Point 170-172°C
    Solubility In Water Limited data; sparingly soluble
    Smiles C1=NNN=C1[N+](=O)[O-]
    Inchi InChI=1S/C2H2N4O2/c7-6(8)2-1-3-5-4-2/h1H,(H,3,4,5)
    Synonyms 4-Nitro-2H-1,2,3-triazole, 4-nitrotriazole
    Pubchem Id 155580

    As an accredited 2H-1,2,3-Triazole,4-Nitro-(9Ci) factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Amber glass bottle, 25 grams, tightly sealed with tamper-evident cap, labeled with hazard symbols, chemical name, and safety information.
    Shipping 2H-1,2,3-Triazole, 4-Nitro-(9Ci) should be shipped in accordance with all applicable regulations for hazardous chemicals. Packaging must include leak-proof, chemically resistant containers with clear labeling. The package should be accompanied by appropriate safety documentation (SDS/MSDS) and shipped by certified carriers specializing in hazardous materials to ensure safe and compliant delivery.
    Storage 2H-1,2,3-Triazole,4-Nitro-(9CI) should be stored in a tightly sealed container, in a cool, dry, and well-ventilated area away from sources of heat, sparks, and open flame. Protect from moisture and incompatible substances such as strong oxidizers and reducing agents. Store away from direct sunlight and clearly label all containers. Handle with appropriate chemical safety precautions.
    Application of 2H-1,2,3-Triazole,4-Nitro-(9Ci)

    Applications of 2H-1,2,3-Triazole,4-Nitro-(9Ci) in Industrial Manufacturing

    As a direct manufacturer of 2H-1,2,3-Triazole,4-Nitro-(9Ci), we support high-value industrial sectors with consistent quality and dependable supply. Below, we outline established downstream applications in which this chemical intermediate contributes critical performance attributes within precisely controlled formulations and processes.

    1. Synthesis of Active Pharmaceutical Ingredients (API) – Triazole Antifungals

    Major producers in the pharmaceutical sector utilize this compound as a key heterocyclic intermediate in the multistep synthesis of triazole-based antifungal agents. Its introduction brings unique electronic properties necessary for the construction of pharmacologically active molecular frameworks. In GMP-compliant manufacturing, chemists introduce this raw material during early-stage heterocycle formation steps to guide subsequent transformations with high specificity. Final APIs are rigorously tested to meet pharmacopeial requirements before formulation into finished pharmaceuticals.

    Industry compliance standards

    • ICH Q7 GMP guidelines for API manufacturing
    • USP/NF monographs for related intermediates
    • EU EMA GMP Part II for pharmaceutical ingredients
    • WHO guidelines for API quality and traceability

    Typical usage ratio

    • 0.8–2.3 molar equivalents, adjusted based on the targeted triazole moiety and reaction pathway. Quantity fine-tuned for yield optimization and impurity control.

    Downstream process integration

    • Charged into controlled-reaction vessels during heterocycle assembly following initial substrate pre-activation. Used alongside phase-transfer catalysts in high-purity solvent systems, with downstream purification via crystallization or chromatography prior to isolation of key intermediates.

    Final product types

    • Active triazole antifungal pharmaceutical ingredients (e.g., fluconazole, itraconazole derivatives)
    • Intermediates for veterinary antifungal agents

    2. Agrochemical Intermediate for Crop Protection Agent Synthesis

    The compound functions as a building block in the development of triazole-type crop protection agents, particularly fungicides. Agrochemical formulators select this intermediate for its reactivity in constructing molecular backbones that feature both fungicidal activity and environmental persistence control. Entry into the synthesis occurs during the cyclization stage following diazotization or reduction steps, and final technical concentrates undergo formulation to meet safety and field application standards.

    Industry compliance standards

    • FAO/WHO specifications for technical agrochemicals
    • OECD guidelines for pesticide intermediate management
    • ISO 9001:2015 quality management for chemical synthesis
    • REACH registration for European agricultural supply

    Typical usage ratio

    • 5–10% by weight relative to the total multi-component synthesis mass, proportional to the sought triazole ring content in the agrochemical active ingredient.

    Downstream process integration

    • Incorporated during controlled batch reactions, particularly in cycloaddition or electrophilic substitution steps, with process monitoring to ensure selectivity and minimize side reactions. The intermediate is isolated and directly coupled with protective or activating groups, followed by solvent extraction and purification.

    Final product types

    • Technical fungicides and formulated crop protection agents (e.g., triazole group products for cereals, vine crops)
    • Pre-mix intermediates for further processing by downstream formulators

    3. Corrosion Inhibitor Additives for Industrial Metalworking Fluids

    Manufacturers of specialized metalworking and heat-transfer fluids employ this compound in custom-formulated corrosion inhibitor blends. It targets localized electrochemical reactions that can degrade copper alloys and ferrous metals under high heat and humidity. Plant QC teams dose and homogenize the additive in fully automated blending lines after preparing the fluid base matrix, ensuring effective dispersibility and compatibility with other organic and inorganic components.

    Industry compliance standards

    • ASTM D4627 for evaluation of corrosion inhibitors in fluids
    • DIN 51360-2 for corrosion testing requirements
    • ISO 6743-7 for classification of metalworking fluids
    • OSHA HCS (HazCom) for worker safety and chemical labeling

    Typical usage ratio

    • 0.03–0.12% by total fluid mass, determined by required corrosion resistance and target metal substrate. Adjustments permitted based on end-user field test results and compatibility assessments.

    Downstream process integration

    • Added at the post-saponification stage in centralized blend tanks after base fluid homogenization and before final pH adjustment. Inline quality control confirms homogeneity prior to filling and packaging.

    Final product types

    • Industrial metalworking fluids for cutting, grinding, or machining
    • Heat transfer and closed system cooling fluids
    • Rust-preventive concentrate formulations

    4. Specialty Dyestuff Synthesis for Performance Textile Manufacturing

    Textile chemical producers synthesize high-colorfastness dyes using selective triazole intermediates for use in performance fabrics. This nitro-triazole compound allows precise alteration of chromophore frameworks during diazo coupling and subsequent polymerization. The stagewise integration ensures color intensity retention even after repeated laundering or exposure to light. Dye forms are further standardized during blending and granulation, prior to export or downstream direct application into textile mills.

    Industry compliance standards

    • OEKO-TEX® Standard 100 for restricted chemicals in textiles
    • ZDHC MRSL for chemical management in textile processing
    • ISO 105-C06 for color fastness evaluation
    • REACH Annex XVII for dye ingredient registration in the EU

    Typical usage ratio

    • 0.2–1.4% of total dye batch, based on color depth and polymer backbone requirements for the intended textile substrate.

    Downstream process integration

    • Introduced during the key diazo-coupling stage, followed by condensation reactions under strictly anhydrous conditions. Further purification and formulation occur via spray drying, granulation, or paste blending, guaranteeing uniform distribution in final synthetic dye grades.

    Final product types

    • Reactive, disperse, and acid dyes for polyester and polyamide textiles
    • Specialty inks for digital textile printing
    • Granulated pigment concentrates for sports and workwear fabrics

    5. Photoresist Formulation Intermediate for Semiconductor Manufacturing

    Electronics chemical manufacturers rely on this compound as a critical precursor during the synthesis of triazole-based photoactive agents used in high-resolution photoresist materials. These agents enhance image resolution and pattern transfer during precision lithography in wafer fabrication. Production lines introduce the intermediate under strictly controlled temperature and atmospheric conditions, often during the final condensation stage. End products are qualified for particle and ionic contaminant thresholds set by semiconductor industry councils.

    Industry compliance standards

    • SEMI C1 and C93 for chemical quality in photolithography
    • ISO 14644 cleanroom production standards
    • JEITA EDR-4708 for chemical purities in electronics manufacturing
    • RoHS 3 Directive (EU 2015/863) for restricted substances

    Typical usage ratio

    • 0.04–0.09 molar equivalents depending on final resin structure and desired photoreactivity, with adjustment based on customer support trials and resist pattern validation results.

    Downstream process integration

    • Dosed during late-stage condensation polymerization following base resin and photoacid generator introduction; batch processed in classified cleanroom environments to meet ultra-low contaminant requirements prior to sub-micron photoresist preparation.

    Final product types

    • Advanced photoresist formulations for integrated circuit and MEMS production
    • Nanoimprint materials and masking agents
    • Pre-mixed monomer blends for semiconductor fabrication OEMs
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