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2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol

    • Product Name 2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol
    • Alias 2-Chloro-6-fluoro-3-methylbenzyl alcohol
    • Einecs 629-596-3
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry admin@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
    VTB
    Specifications

    HS Code

    505813

    Chemical Name 2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol
    Cas Number 113313-22-7
    Molecular Formula C8H8ClFO
    Molecular Weight 174.60 g/mol
    Appearance Colorless to pale yellow liquid
    Purity Typically ≥98%
    Solubility Slightly soluble in water; soluble in organic solvents
    Smiles CC1=C(C(=CC=C1CO)Cl)F
    Storage Conditions Store in a cool, dry, well-ventilated place

    As an accredited 2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Amber glass bottle, 100 grams, with secure screw cap; labeled with chemical name, hazard information, CAS number, and lot details.
    Shipping 2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol is shipped in tightly sealed containers, protected from light, moisture, and incompatible materials. Transport must comply with applicable chemical shipping regulations. Appropriate hazard labeling and documentation are included. Temperature and handling precautions are observed to ensure product integrity and safe delivery. For laboratory use only.
    Storage Store **2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol** in a tightly sealed container, in a cool, dry, and well-ventilated area away from direct sunlight and incompatible materials such as strong oxidizers. Keep it at room temperature and avoid moisture. Ensure appropriate labeling and place on dedicated chemical shelving to prevent accidental mixing. Use secondary containment to prevent spills and wear suitable protective equipment during handling.
    Application of 2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol

    Applications of 2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol in Industrial Manufacturing

    2-Chloro-6-Fluoro-3-Methylbenzyl Alcohol acts as a critical intermediate in demanding industries relying on precise molecular building blocks for final product performance. Below, we detail downstream use cases, with industry-specific integration and regulatory requirements, demonstrating the value this compound brings to specialized manufacturing environments.

    1. Agrochemical Synthesis (Selective Herbicide Intermediate)

    In the agrochemical sector, formulators employ this compound during the synthesis of next-generation selective herbicides. Its unique substitution enables the preparation of heterocyclic frameworks that facilitate dual-mode action in weed control solutions. The process requires strict adherence to trace impurity guidelines to prevent phytotoxicity in the final products, ensuring safe deployment in modern crop protection programs.

    Industry compliance standards

    • FAO/WHO Specification for Pesticide Ingredients (Current Version)
    • ISO 17025 Certification for Analytical Methods Validation
    • OECD Test Guideline Series for Environmental Fate
    • ECHA REACH Annex requirements for registration of new agricultural actives

    Typical usage ratio

    • 0.6%–1.4% by weight, with final ratio tailored by molecular target and impurity control. Downstream ratios depend on structural retention in the active moiety after cyclization or substitution steps.

    Downstream process integration

    • Batch addition immediately following base-catalyzed halogen exchange, prior to ring closure and sulfonation. Incorporated as a limiting reagent in the preparative stage for benzothiadiazine-ring herbicides.

    Final product types

    • Selective sulfonylurea herbicides for cereal and soybean rotation fields
    • Pyrimidinyl carboxamide actives for broadleaf and grass weed control
    • Suspension concentrate (SC) and water-dispersible granule (WG) agroformulations

    2. Pharmaceutical Intermediate for Advanced Active Ingredient Synthesis

    The pharmaceutical industry uses this benzyl alcohol derivative as a core structural precursor in the development of fluorinated API scaffolds, essential for metabolic stability enhancements and targeted bioactivity modulation. GMP-compliant operations require validated cleaning protocols and legacy impurity clearance, making the traceability of every batch critical during clinical-phase and commercial production.

    Industry compliance standards

    • ICH Q7 Good Manufacturing Practice (GMP) Guideline for APIs
    • European Pharmacopoeia (Ph. Eur.) for chemical intermediates
    • FDA 21 CFR Part 211 for finished pharmaceutical production
    • USP Chapter <467> for residual solvent analysis

    Typical usage ratio

    • 0.15–0.55 molar equivalents relative to the coupling core, adjusted according to final synthetic route (e.g., nucleophilic aromatic substitution, C–N coupling).

    Downstream process integration

    • Charged as the initial benzylating agent during the C–O or C–N bond formation step, typically after deprotection or activation of the nucleophile. All stages require tracking under master batch records and cleaning validation matrices.

    Final product types

    • Precursor to fluorinated non-steroidal anti-inflammatory drugs (NSAIDs)
    • Small-molecule oncology actives with fluorinated aromatic scaffolds
    • Intermediates for CNS therapeutic candidates

    3. Specialty Dye and Pigment Precursor

    This benzyl alcohol variant serves as a tailored synthesis precursor in high-performance dyes and specialty pigments, supporting substitution patterns that boost lightfastness and color saturation. Applications center on functional colorants for technical textiles and plastics, integrating seamlessly into fine-tuned process control systems for reproducible chromaticity and dispersion quality.

    Industry compliance standards

    • EN 71-3:2019+A1:2021 (Safety of Toys—Migration of Certain Elements)
    • ISO 105-X12 for textile color fastness
    • Oeko-Tex® Standard 100 certification for restricted substances
    • EU REACH Annex XVII for color additive restrictions

    Typical usage ratio

    • 1.2%–1.8% weight basis in dye precursor charge, modulated by pigment load requirements and solvent system compatibility.

    Downstream process integration

    • Integrated into azo and anthraquinone dye synthesis after catalytic reduction steps; introduced prior to coupling reactions to generate modified benzyl chromophores, ensuring controlled particle size and hue stability.

    Final product types

    • Sublimation dyes for polyester printing
    • High-durability plastic masterbatches for automotive interiors
    • Technical textile dyes with improved environmental persistence

    4. Electronic Chemical Manufacturing (Advanced Photoresist Monomer Synthesis)

    Producers in the electronics field integrate this compound as a monomer unit in advanced photoresist resin systems, where substituent effects govern resolution, sensitivity, and line-edge roughness in semiconductor lithography. Purity and moisture control are strictly enforced due to the impact on etch rate uniformity in downstream pattern transfer processes.

    Industry compliance standards

    • SEMI C93 (Specifications for Microelectronics-Grade Chemicals)
    • IATF 16949 for semiconductor process chemical suppliers
    • IEC 62474 for declaration of material composition in electronic products
    • RoHS 3 (Directive 2015/863/EU) for restriction of hazardous substances

    Typical usage ratio

    • 0.9%–2.2% by weight in photoresist resin prepolymer blends, tuned by crosslink density, feature size, and developer compatibility in 193 nm immersion and EUV applications.

    Downstream process integration

    • Dosed into polycondensation reactors following resin backbone formation, with continuous analytical QC via GC–MS to monitor for ionic residue levels. Employed immediately before resin adjustment steps to secure molecular weight distribution and photoacid response.

    Final product types

    • 193 nm immersion lithography photoresists for advanced CMOS manufacturing
    • EUV photoresist monomers for next-generation chip production
    • Coatings for semiconductor wafer fabrication masking
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