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HS Code |
145210 |
| Iupac Name | 2-Amino-3-methoxybenzoic acid |
| Molecular Formula | C8H9NO3 |
| Molecular Weight | 167.16 g/mol |
| Cas Number | 616-10-6 |
| Appearance | Off-white to beige solid |
| Melting Point | 163-166 °C |
| Solubility In Water | Slightly soluble |
| Purity | Typically ≥98% |
| Synonyms | 3-Methoxyanthranilic acid; o-Amino-m-anisic acid |
| Smiles | COC1=C(C=CC(=C1)C(=O)O)N |
| Inchi | InChI=1S/C8H9NO3/c1-12-6-3-2-5(8(11)10)4-7(6)9/h2-4H,9H2,1H3,(H,10,11) |
| Pka | Approx. 3.9 (carboxylic acid) |
| Storage Conditions | Store at room temperature, away from moisture and light |
As an accredited 2-Amino-3-Methoxybenzoic Acid factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | A 25-gram amber glass bottle, sealed with a screw cap, labeled "2-Amino-3-Methoxybenzoic Acid," includes hazard and purity information. |
| Shipping | 2-Amino-3-Methoxybenzoic Acid is shipped in tightly sealed, chemical-resistant containers to prevent contamination and moisture exposure. Packages are clearly labeled with hazard and handling information and transported according to applicable regulations for non-hazardous laboratory chemicals, ensuring safe delivery. Proper documentation accompanies each shipment for traceability and compliance purposes. |
| Storage | 2-Amino-3-methoxybenzoic acid should be stored in a tightly closed container, in a cool, dry, and well-ventilated area away from incompatible substances such as strong oxidizers. Protect it from moisture, heat, and direct sunlight. Use appropriate personal protective equipment when handling, and label storage containers clearly to avoid accidental misuse or contamination. |
Applications of 2-Amino-3-Methoxybenzoic Acid in Industrial ManufacturingAs a direct manufacturer of 2-Amino-3-Methoxybenzoic Acid, we supply this intermediate to specialized downstream sectors requiring consistency in material quality and regulatory traceability. Below, we outline its principal industrial applications, highlighting compliance requirements, formulation concentrations, process roles, and end product categories for each segment. 1. Pharmaceutical Intermediate for Active Pharmaceutical Ingredient (API) SynthesisIn the pharmaceutical sector, this compound serves as a key intermediate during the synthesis of certain APIs, especially in the preparation of non-steroidal anti-inflammatory drugs and specific benzoxazole or benzothiazole derivatives. Our customers use it at defined stages in multi-step reaction cascades, where purity and trace metal content directly influence the safety and value of the resulting medical compounds. Such processes require traceability and batch reproducibility, with downstream documentation for regulatory dossiers and pre-registration of production batches tied to Good Manufacturing Practice (GMP) frameworks. Industry compliance standards
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2. Dye and Pigment Synthesis Building BlockDye manufacturers incorporate our material in the synthesis of azo and anthraquinone dyes, specifically for applications requiring tailored electronic properties and solubility. Its methoxy and amino functionalities allow for highly specific coupling reactions, impacting tone, fastness, and chromatic purity in textile and specialty pigment production. Large-scale downstream use aligns with both chemical process safety and environmental standards, given heightened scrutiny on aromatic intermediates. Industry compliance standards
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3. Agrochemical Intermediates for Selective Herbicide SynthesisManufacturers of crop protection agents utilize this material in synthesis routes for heterocyclic-based selective herbicides. Its reactivity profile enables formation of target ring structures vital for bioactivity, supporting the production of actives compliant with regional pesticide residue and environmental fate requirements. Integrated use in multi-step agrochemical syntheses ensures traceable input streams for regulatory review and sustainability audits. Industry compliance standards
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4. Specialty Chemical Synthesis—Photoresist MaterialsProducers of advanced materials for microelectronics integrate our product as an intermediate for fabricating aromatic ester and amide groups within photoresist polymers. The balance of electron-donating and withdrawing substituents suits pattern resolution and sensitivity requirements in semiconductor lithography. Strict control over base purity and trace organic analytes ensures photoresist resins meet defect density and etch resistance targets set by wafer fabs. Industry compliance standards
Typical usage ratio
Downstream process integration
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Tel: +8615371019725
Email: admin@sinochem-nanjing.com
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