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HS Code |
688384 |
| Productname | 2,4-Dimethoxybenzenesulfonyl Chloride |
| Casnumber | 4396-00-9 |
| Molecularformula | C8H9ClO4S |
| Molecularweight | 236.68 g/mol |
| Appearance | White to off-white solid |
| Meltingpoint | 70-74°C |
| Boilingpoint | No data available (decomposes) |
| Solubility | Soluble in organic solvents such as dichloromethane and chloroform |
| Density | 1.40 g/cm³ (approximate) |
| Purity | Typically ≥98% |
| Synonyms | 2,4-Dimethoxybenzenesulfonyl chloride; 2,4-Dimethoxybenzenesulfonic acid chloride |
| Chemicalstructure | COC1=CC(=C(C=C1OC)S(=O)(=O)Cl) |
As an accredited 2,4-Dimethoxybenzenesulfonyl Chloride factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | White, opaque plastic bottle containing 100 grams of 2,4-Dimethoxybenzenesulfonyl Chloride; secure screw-cap; clearly labeled with hazard warnings. |
| Shipping | 2,4-Dimethoxybenzenesulfonyl chloride should be shipped in tightly sealed containers, protected from moisture and light. It must be clearly labeled, packed in accordance with regulations for corrosive substances, and transported under dry, cool conditions. Appropriate hazard communication and documentation are required to ensure safe handling during transit. |
| Storage | 2,4-Dimethoxybenzenesulfonyl chloride should be stored in a tightly closed container, in a cool, dry, and well-ventilated area, away from moisture and incompatible substances such as bases and strong oxidizers. Protect it from light and sources of ignition. Handle under an inert atmosphere (e.g., nitrogen or argon) if possible, and avoid exposure to air and humidity to prevent decomposition. |
Applications of 2,4-Dimethoxybenzenesulfonyl Chloride in Industrial Manufacturing2,4-Dimethoxybenzenesulfonyl Chloride plays a precise role as a sulfonating and protecting reagent in various chemical synthesis routes across multiple industrial sectors. Our production implements strict QC and traceable batch documentation to support advanced manufacturing for pharmaceuticals, agrochemicals, specialty polymers, and electronics intermediates. 1. Active Pharmaceutical Ingredient (API) SynthesisPharmaceutical manufacturing uses 2,4-Dimethoxybenzenesulfonyl Chloride in selective sulfonyl protection of amine and alcohol functionalities during API intermediate synthesis. The material allows controlled introduction and subsequent removal of sulfonyl groups, securing high regioselectivity and purity for critical steps in antihypertensive, anti-inflammatory, and antibacterial compound preparation. Our QA protocols ensure low residuals according to final product pharmacopoeial requirements. Industry compliance standards
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2. Agrochemical Intermediate SynthesisModern agrochemical production applies this sulfonyl chloride for protection and functionalization steps in the synthesis of pre-emergent herbicide and insecticide actives. Its electrophilic reactivity allows selective transformation of heterocyclic scaffolds and controlled deprotection under mild hydrolysis, ensuring minimal impurity profile and effective downstream reaction management. Industry compliance standards
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3. Specialty Polymer FunctionalizationThe specialty polymers sector utilizes 2,4-Dimethoxybenzenesulfonyl Chloride as a sulfonating agent for modifying aromatic monomers and polymer backbones. This process enables fine-tuning of polymer solubility, ionic conductivity, and chemical resistance. Sulfonated polyaryletherketones, polyimides, and polystyrenes synthesized using this material show improved processing performance and end-use function in high-performance films and membranes. Industry compliance standards
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4. Electronic Materials and Photoresist PrecursorsIn the electronics industry, 2,4-Dimethoxybenzenesulfonyl Chloride serves in the synthesis of sulfonated aromatic compounds that become photoacid generators (PAGs) and charge transport materials for lithography and microelectronics. The high purity required for these applications aligns with rigorous sub-ppm metal and organics control, essential for preventing structural defects in photoresist coatings and thin-film transistor fabrication. Industry compliance standards
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