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2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid

    • Product Name 2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid
    • Alias 4-Chloro-3-nitrobenzoyl-o-toluic acid
    • Einecs 242-528-0
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry admin@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
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    Specifications

    HS Code

    405226

    Product Name 2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid
    Cas Number 842133-39-7
    Molecular Formula C14H8ClNO5
    Molecular Weight 305.67 g/mol
    Appearance Yellow solid
    Purity Typically ≥98%
    Solubility Slightly soluble in DMSO, insoluble in water
    Storage Temperature 2-8°C
    Synonyms 4-Chloro-3-nitrobenzoyl-2-benzoic acid
    Smiles C1=CC=C2C(=C1)C(=O)C(=O)C3=CC(=C(C=C3)Cl)[N+](=O)[O-]
    Inchi InChI=1S/C14H8ClNO5/c15-10-7-9(16(20)21)3-5-12(10)14(19)11-6-2-1-4-8(11)13(17)18/h1-7H,(H,17,18)

    As an accredited 2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing Amber glass bottle containing 25 grams, tightly sealed with a screw cap, labeled with chemical name, quantity, and safety information.
    Shipping **Shipping Description:** 2-(4-Chloro-3-Nitrobenzoyl)benzoic acid is shipped in tightly sealed containers, protected from moisture, light, and extreme temperatures. The package includes clear labeling for chemical identification and hazard classification. Shipments comply with local and international regulations, typically using UN-approved packaging for safe delivery and handling of potentially hazardous substances.
    Storage Store 2-(4-Chloro-3-nitrobenzoyl)benzoic acid in a tightly sealed container, away from light, moisture, and incompatible substances such as strong oxidizers and bases. Keep it in a cool, dry, well-ventilated area, ideally at room temperature (15–25°C). Handle with appropriate personal protective equipment and follow standard laboratory safety protocols to prevent exposure and contamination.
    Application of 2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid

    Applications of 2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid in Industrial Manufacturing

    2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid provides a critical functional intermediate for high-value downstream chemical production. Our expertise in controlled synthesis and purification ensures reliable supply to multiple specialized sectors, supporting batch uniformity and traceability across regulated industries.

    1. Pharmaceutical Intermediate Synthesis for Anti-Inflammatory APIs

    Pharmaceutical manufacturers use 2-(4-Chloro-3-Nitrobenzoyl)Benzoic Acid as a core building block during the multi-step synthesis of select non-steroidal anti-inflammatory drug (NSAID) APIs. It typically enters the process at the stage of aromatic acylation or condensation, contributing the required substituted benzoyl framework. Proper handling ensures conformity with pharmacopoeial monograph specifications, controlling residual solvents and related impurities to meet stringent downstream release criteria for both pilot plant and commercial production. Process engineers often adapt both input ratio and reaction time to achieve target conversion rates and reduce purification steps.

    Industry compliance standards

    • ICH Q7 Good Manufacturing Practice for Active Pharmaceutical Ingredients
    • USP General Chapter <821> Chromatography for Analytical Compliance
    • European Pharmacopoeia specifications for raw material purity
    • FDA 21 CFR 211 for Current Good Manufacturing Practices in finished pharmaceuticals

    Typical usage ratio

    • 0.8 – 1.1 mole equivalents per API batch, adjusted depending on desired yield, reaction selectivity, and impurity tolerance in subsequent steps

    Downstream process integration

    • Introduced in the aromatic acylation or coupling step with aminobenzoic derivatives
    • Employs solvent systems such as DMF or DMSO for homogeneous reaction mixture formation
    • Managed with in-process HPLC and NMR monitoring to track conversion and byproduct formation
    • Final API crystallization and filtration follows downstream after de-protection and purification

    Final product types

    • Bulk NSAID active pharmaceutical ingredients (e.g., diclofenac intermediates)
    • Injectable or oral dosage tablet forms post formulation
    • Export-ready GMP pharmaceutical intermediates
    • Custom pharmaceutical ingredients for patent filings

    2. Advanced Agrochemical Manufacturing (Herbicide Precursors)

    Agrochemical producers incorporate this acid derivative in the synthesis of selective herbicidal actives, where its structural motifs enable fine-tuning of biological activity against target weed species. Synthesis protocols require precise handling under controlled environments, particularly when working with chlorinated and nitro intermediates regulated under environmental guidelines. Quality teams regularly audit trace impurity profiles to ensure compliance with agricultural chemical registration dossiers. End applications focus on the efficiency of field-delivered actives and on facilitating further coupling with suffocative or carboxylic partners, yielding advanced herbicide formulations.

    Industry compliance standards

    • FAO/WHO Specifications for Plant Protection Products
    • OECD Principles of Good Laboratory Practice
    • ISO 17025 for chemical analysis of active substances
    • REACH compliance for registration, evaluation, and authorization of chemical intermediates

    Typical usage ratio

    • 5-12% by mass relative to total organic input in herbicide synthesis, with variation based on the targeted molecular scaffold and commercial purity requirements

    Downstream process integration

    • Fed directly to the initial condensation reactor with alkoxy or amino co-reactants
    • Deployed under nitrogen blanketing to avoid oxidation of nitro-groups
    • Monitored via GC-MS for residual solvents and byproduct reduction
    • Product stream typically undergoes phase separation and drying prior to formulation

    Final product types

    • Selectivity-enhanced herbicidal active ingredients
    • Commercially preformulated EC (emulsifiable concentrate) products
    • Granular field-application herbicide blends
    • API-grade intermediates for next-generation crop protection research

    3. Specialty Dye and Pigment Intermediates

    Specialty dye manufacturers employ this compound during manufacture of high-performance colorants where unique nitro-chloro substitution patterns affect lightfastness and substrate bonding. The raw material enters diazotization or coupling reactions forming the core chromophore for application-specific azo or anthraquinone dyes. Colorant formulators require tight batch tracking and impurity assessment as dictated by industrial and environmental standards, particularly for products bound for textile and plastics coloration. Control of reaction stoichiometry and pH remains essential to yield the desired solubility and hue intensity in end-use scenarios.

    Industry compliance standards

    • ETAD (European Association of Textile, Auxiliaries and Dye Manufacturers) safety guidelines
    • OEKO-TEX® Standard 100 for textile dyeing compounds
    • REACH Annex XVII for restriction of hazardous substances
    • ISO 9001 QMS for specialty chemicals production

    Typical usage ratio

    • 3 – 8% by weight in dye precursor formulations; ratio varies based on desired color shade, intensity, and fastness ratings

    Downstream process integration

    • Loaded during diazotization or Friedel-Crafts coupling to establish the core aromatic system
    • Mixed under controlled pH to facilitate appropriate chromophore development
    • Post-reaction, the mixture undergoes phase extraction and analytical validation for color strength
    • Filtered and spray-dried before shipping to customer plants for downstream blending

    Final product types

    • Reactive dyestuff powders for polyester or polyamide textiles
    • Solvent dyes for industrial coatings and plastics
    • Dispersed pigment concentrates for automotive finishes
    • Customized colorant intermediates for specialty inkjet formulations

    4. Electronic Industry – High-Purity Material for Semiconductor Photoresist Synthesis

    Manufacturers producing advanced photoresists source this specialty acid for integration into custom aromatic polymers designed for microlithography in semiconductor fabrication. The controlled placement of chloro and nitro groups influences polymer absorption and crosslinking response during wafer exposure processes. Ultra-high purity requirements dictate supply with full trace metal and anion documentation. Incoming QC analyzes for <1 ppm metal contaminants and verifies spectral conformity. Integration steps demand precise solution preparation under cleanroom environments, supporting downstream spin-coating and developer performance.

    Industry compliance standards

    • SEMI C1/C2 standards for Electronic Grade Chemicals
    • IPC-4101E for base materials in printed circuit applications
    • ISO 14644-1 for cleanroom production and packaging
    • RoHS Directive 2011/65/EU for restriction of hazardous substances in electronics

    Typical usage ratio

    • 1.5 – 3.5% weight of resin mass in precursor batches, fine-tuned based on polymer weight-average molecular weight targets and lithography sensitivity

    Downstream process integration

    • Dissolved in high-purity organic solvents and reacted with polyhydroxystyrene or acrylic resins
    • Filtered via submicron PTFE units to eliminate particulates
    • QC protocols ensure batch-to-batch reproducibility in molecular structure and impurity profile
    • Final formulated photoresist sent for wafer spin-coating and etch cycle qualification

    Final product types

    • Positive and negative tone photoresist chemicals for IC fabrication
    • Micro-patternable resins for MEMS and microdisplay devices
    • Base materials for advanced printed circuit phototooling
    • Custom resist systems for high-resolution photolithography applications
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