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HS Code |
852568 |
| Chemical Formula | Al2(CH3)6 |
| Molecular Weight | 144.18 g/mol |
| Appearance | Colorless, pyrophoric liquid |
| Density | 0.74 g/cm³ (at 20°C) |
| Melting Point | -15 °C |
| Boiling Point | 125 °C |
| Solubility In Water | Reacts violently |
| Cas Number | 75-24-1 |
| Vapor Pressure | 39 mmHg (at 25°C) |
| Flash Point | -18 °C (closed cup) |
| Autoignition Temperature | 220 °C |
| Odor | Sharp, unpleasant |
| Refractive Index | 1.464 (at 20°C) |
As an accredited Trimethylaluminum factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Trimethylaluminum is packaged in a 100 mL sealed stainless steel cylinder, featuring safety valves and a yellow hazard warning label. |
| Shipping | Trimethylaluminum must be shipped as a hazardous material due to its high flammability and reactivity with water. It is typically transported in sealed, inert-gas-filled metal cylinders or cans marked “Dangerous When Wet.” Packaging complies with DOT regulations, and handling requires trained personnel using appropriate protective equipment to prevent accidental ignition or exposure. |
| Storage | Trimethylaluminum should be stored in tightly sealed containers under an inert atmosphere, such as nitrogen or argon, to prevent contact with air or moisture, as it is highly pyrophoric and reacts violently with water. Storage should be in a cool, dry, and well-ventilated area, away from incompatible materials and sources of ignition, in approved flammable liquid storage cabinets. |
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Purity 99.999%: Trimethylaluminum with a purity of 99.999% is used in semiconductor manufacturing, where it enables the deposition of ultra-high-purity aluminum oxide thin films with minimal impurities. Stability temperature 50°C: Trimethylaluminum with a stability temperature of 50°C is used in atomic layer deposition processes, where it ensures consistent precursor delivery without thermal decomposition. Low molecular weight (72.09 g/mol): Trimethylaluminum of low molecular weight (72.09 g/mol) is used in catalyst preparation for Ziegler–Natta polymerization, where it promotes rapid catalyst activation and enhanced polymer yield. Volatility (high vapor pressure 13 kPa at 20°C): Trimethylaluminum with high vapor pressure (13 kPa at 20°C) is used in metalorganic chemical vapor deposition, where it facilitates uniform film growth by efficient vapor-phase transport. Viscosity (0.8 mPa·s at 25°C): Trimethylaluminum with low viscosity (0.8 mPa·s at 25°C) is used in organometallic synthesis, where it allows precise and repeatable reagent injection for controlled reaction kinetics. Trace metal content <1 ppm: Trimethylaluminum with trace metal content below 1 ppm is used in microelectronics fabrication, where it ensures high device reliability by minimizing contamination. Moisture content <50 ppm: Trimethylaluminum with moisture content less than 50 ppm is used in thin film encapsulation, where it prevents hydrolysis and improves film uniformity and stability. |
Competitive Trimethylaluminum prices that fit your budget—flexible terms and customized quotes for every order.
For samples, pricing, or more information, please call us at +8615371019725 or mail to admin@sinochem-nanjing.com.
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Tel: +8615371019725
Email: admin@sinochem-nanjing.com
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