Purity 99.9%: Tin Tetrachloride [Anhydrous] with purity 99.9% is used in high-purity semiconductor manufacturing, where it ensures minimal contamination in thin film deposition processes.

Molecular Weight 260.52 g/mol: Tin Tetrachloride [Anhydrous] with a molecular weight of 260.52 g/mol is used in catalyst preparation for organic synthesis, where it enables precise stoichiometry and reaction control.

Melting Point -33°C: Tin Tetrachloride [Anhydrous] with a melting point of -33°C is used in chemical vapor deposition systems, where its low melting point allows efficient vapor phase transport.

Particle Size < 10 µm: Tin Tetrachloride [Anhydrous] with particle size less than 10 µm is used in advanced ceramic coatings, where uniform particle distribution improves coating adhesion and surface finish.

Stability Temperature up to 100°C: Tin Tetrachloride [Anhydrous] stable up to 100°C is used for glass surface treatment, where high thermal stability ensures consistent surface modification without decomposition.

Reactivity Index 95%: Tin Tetrachloride [Anhydrous] with a reactivity index of 95% is used in synthesis of organotin compounds, where high reactivity increases product yield and purity.

Moisture Content < 0.05%: Tin Tetrachloride [Anhydrous] with moisture content below 0.05% is used in moisture-sensitive chemical reactions, where low water content prevents hydrolytic degradation.

Volatility 12.1 mmHg at 20°C: Tin Tetrachloride [Anhydrous] with volatility of 12.1 mmHg at 20°C is used in metal halide lamp production, where controlled vapor pressure aids precise dosing and atmosphere control.