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HS Code |
263819 |
| Chemicalname | Tetramethylsilane |
| Molecularformula | C4H12Si |
| Molarmass | 88.22 g/mol |
| Casnumber | 75-76-3 |
| Appearance | Colorless liquid |
| Boilingpoint | 26.5 °C |
| Meltingpoint | -99 °C |
| Density | 0.648 g/cm³ at 20°C |
| Flashpoint | -18 °C |
| Refractiveindex | 1.369 at 20°C |
| Vaporpressure | 833 mmHg at 25°C |
| Solubilityinwater | Insoluble |
| Odor | Ether-like |
| Structure | Tetrahedral |
| Ecnumber | 200-899-1 |
As an accredited Tetramethylsilane factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Tetramethylsilane is packaged in a 100 mL amber glass bottle with a secure screw cap, labeled with hazard and identity information. |
| Shipping | Tetramethylsilane should be shipped in tightly sealed containers under an inert atmosphere, away from heat, sparks, or open flames. It is classified as a flammable liquid (UN1993) and must be handled according to hazardous material regulations. Appropriate labeling and documentation are required. Store and transport in a cool, well-ventilated area. |
| Storage | Tetramethylsilane should be stored in a tightly closed container in a cool, dry, and well-ventilated area away from heat, sparks, open flames, and incompatible materials such as oxidizing agents. The storage area should be equipped with spill containment to prevent environmental contamination, and containers must be clearly labeled. Protect from moisture and direct sunlight. Store under an inert atmosphere if possible. |
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Purity 99.9%: Tetramethylsilane with purity 99.9% is used in NMR spectroscopy calibration, where it ensures high signal clarity and reproducibility. Boiling Point 26.5°C: Tetramethylsilane with a boiling point of 26.5°C is utilized in gas chromatography as a volatile internal standard, where it enables precise retention time referencing. Molecular Weight 88.22 g/mol: Tetramethylsilane with molecular weight 88.22 g/mol is applied in organosilicon synthesis, where it allows controlled silicon atom integration. Low Viscosity: Tetramethylsilane with low viscosity is used in advanced coating formulations, where it enhances film uniformity and smoothness. Volatility: Tetramethylsilane with high volatility is used in chemical vapor deposition processes, where it provides efficient silicon doping. Thermal Stability up to 150°C: Tetramethylsilane with thermal stability up to 150°C is used in plasma etching applications, where it maintains structural integrity during processing. Moisture Sensitivity: Tetramethylsilane with low moisture sensitivity is used in anhydrous synthesis reactions, where it minimizes hydrolysis and byproduct formation. Reactivity Index: Tetramethylsilane with a reactivity index tailored for cross-coupling is used in pharmaceutical intermediate production, where it offers selective functional group transformation. |
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