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HS Code |
999165 |
| Chemicalname | Tetrafluorohydrazine |
| Casnumber | 10036-47-2 |
| Molecularformula | N2F4 |
| Molarmass | 104.00 g/mol |
| Appearance | Colorless gas |
| Odor | Repulsive, musty odor |
| Meltingpoint | -43.8 °C |
| Boilingpoint | -2.2 °C |
| Density | 1.55 g/L (at 0 °C, 1 atm) |
| Solubilityinwater | Slightly soluble |
| Vaporpressure | 3.29 atm (at 20 °C) |
| Refractiveindex | 1.252 (liquid) |
| Autoignitiontemperature | Non-flammable |
As an accredited Tetrafluorohydrazine factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | A high-pressure steel gas cylinder, 5 liters capacity, labeled "Tetrafluorohydrazine, NF₂-NF₂," with hazardous material and handling warnings. |
| Shipping | Tetrafluorohydrazine should be shipped in tightly sealed, corrosion-resistant cylinders or containers, under a dry, inert atmosphere. It is a toxic, compressed gas and must be handled as a hazardous material, class 2.3 (toxic gas). Transport requires proper labeling, documentation, and precautions against heat, physical damage, and cylinder leakage. |
| Storage | Tetrafluorohydrazine should be stored in tightly sealed containers under an inert atmosphere, such as nitrogen or argon, to prevent moisture ingress and decomposition. Store in a cool, dry, and well-ventilated area, away from heat, sparks, open flames, and incompatible materials such as strong oxidizers and reducing agents. Use corrosion-resistant materials and ensure containers are clearly labeled. |
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Purity 99.9%: Tetrafluorohydrazine with purity 99.9% is used in advanced semiconductor manufacturing, where it ensures minimal contaminant introduction and maximizes device yield. Molecular Weight 104 g/mol: Tetrafluorohydrazine with molecular weight 104 g/mol is used in fluorination processes in pharmaceutical synthesis, where it enables precise molecular modification and improved reaction efficiency. Gaseous Form: Tetrafluorohydrazine in gaseous form is used in plasma etching for microelectronics, where it provides uniform etching profiles and enhanced feature resolution. Stability Temperature up to 50°C: Tetrafluorohydrazine with stability temperature up to 50°C is used in chemical vapor deposition, where it maintains reactivity without decomposition for consistent film quality. Melting Point -43°C: Tetrafluorohydrazine with melting point of -43°C is used in specialty gas mixtures for analytical calibration, where it supports stable storage and transport under controlled conditions. Low Moisture Content <10 ppm: Tetrafluorohydrazine with low moisture content less than 10 ppm is used in electronics-grade applications, where it prevents moisture-induced defects and enhances product reliability. |
Competitive Tetrafluorohydrazine prices that fit your budget—flexible terms and customized quotes for every order.
For samples, pricing, or more information, please call us at +8615371019725 or mail to admin@sinochem-nanjing.com.
We will respond to you as soon as possible.
Tel: +8615371019725
Email: admin@sinochem-nanjing.com
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