Purity 99%: Tetraethyl Orthosilicate with purity 99% is used in optical glass manufacturing, where high silica yield and material clarity are achieved.

Viscosity Grade Low: Tetraethyl Orthosilicate of low viscosity grade is used in sol-gel processing, where it enables uniform film formation and reduced surface defects.

Molecular Weight 208.33 g/mol: Tetraethyl Orthosilicate (molecular weight 208.33 g/mol) is used in the synthesis of silica nanoparticles, where precise particle size control is obtained.

Hydrolyzable Silanol Content High: Tetraethyl Orthosilicate with high hydrolyzable silanol content is used in catalyst support preparation, where enhanced catalytic activity and dispersion result.

Stability Temperature Up to 250°C: Tetraethyl Orthosilicate with stability temperature up to 250°C is used in heat-resistant coatings, where excellent thermal stability is maintained.

Particle Size Sub-Micron: Tetraethyl Orthosilicate with sub-micron particle size is used in advanced ceramics production, where fine microstructure and improved mechanical strength are achieved.

Water Content <0.1%: Tetraethyl Orthosilicate with water content below 0.1% is used in moisture-sensitive sealant formulations, where superior hydrolytic stability and longevity are provided.

Refractive Index 1.383: Tetraethyl Orthosilicate with refractive index 1.383 is used in optical fiber fabrication, where consistent light transmission and signal clarity are ensured.

Boiling Point 168°C: Tetraethyl Orthosilicate with boiling point 168°C is used in vapor deposition processes, where controlled evaporation and uniform deposition are obtained.

Density 0.933 g/cm³: Tetraethyl Orthosilicate with density 0.933 g/cm³ is used in resin-reinforced composites, where optimal dispersion and homogeneous phase distribution occur.