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HS Code |
174117 |
| Chemical Name | Tellurium Hexafluoride |
| Chemical Formula | TeF6 |
| Molar Mass | 241.6 g/mol |
| Appearance | colorless gas |
| Odor | pungent |
| Melting Point | -38 °C |
| Boiling Point | -38.2 °C |
| Density | 3.68 g/L (gas at STP) |
| Solubility In Water | reacts with water |
| Vapor Pressure | 32.6 atm at 25 °C |
| Toxicity | highly toxic |
| Cas Number | 7783-80-4 |
As an accredited Tellurium Hexafluoride factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.
| Packing | Tellurium Hexafluoride, 500g, is supplied in a corrosion-resistant, sealed steel cylinder with secure valve, labeled with hazard warnings. |
| Shipping | Tellurium Hexafluoride (TeF₆) must be shipped as a hazardous, toxic, and corrosive gas under pressure. It is transported in approved, tightly sealed steel cylinders with appropriate hazard labeling. Shipments must comply with local, national, and international dangerous goods regulations, including protective handling, ventilation, and emergency response provisions. |
| Storage | Tellurium hexafluoride (TeF₆) should be stored in tightly sealed, corrosion-resistant containers, such as those made from nickel or Monel, as it reacts with glass and most metals. Storage areas must be cool, dry, well-ventilated, and separated from moisture and incompatible substances. Proper labeling and secure containment are essential to prevent leaks, exposure, and environmental contamination. |
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Purity 99.9%: Tellurium Hexafluoride of purity 99.9% is used in advanced semiconductor etching, where it ensures precise pattern formation and minimal contamination. Molecular Weight 241.6 g/mol: Tellurium Hexafluoride with molecular weight 241.6 g/mol is used in chemical vapor deposition, where it facilitates consistent thin film growth. High Volatility: Tellurium Hexafluoride with high volatility is used in microelectronics manufacturing, where it enables efficient gas-phase processing of substrates. Decomposition Temperature 400°C: Tellurium Hexafluoride with decomposition temperature 400°C is used in plasma-enhanced processes, where it provides stable reactivity during high-temperature operations. Gas Phase Stability: Tellurium Hexafluoride exhibiting gas phase stability is used in precision crystal growth, where it maintains uniform chemical delivery and reduced impurity incorporation. Density 3.25 g/L: Tellurium Hexafluoride with density 3.25 g/L is used in gas sensor calibration, where it produces accurate test atmospheres for instrument validation. Ultra-Low Moisture Content: Tellurium Hexafluoride with ultra-low moisture content is used in fiber optic fabrication, where it prevents formation of light-scattering defects. Cylinder Packaging: Tellurium Hexafluoride supplied in specialty cylinder packaging is used in research laboratories, where it ensures safe transport and controlled dispensing. |
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