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Tantalum Pentachloride

    • Product Name Tantalum Pentachloride
    • Alias Tantalum(V) chloride
    • Einecs 233-250-7
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry admin@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
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    Specifications

    HS Code

    780019

    Chemical Name Tantalum Pentachloride
    Chemical Formula TaCl5
    Molar Mass 358.205 g/mol
    Appearance White to off-white crystalline solid
    Melting Point 216 °C
    Boiling Point 239 °C (sublimes)
    Density 3.68 g/cm3
    Solubility In Water Reacts violently
    Solubility In Organic Solvents Soluble in chloroform, carbon tetrachloride
    Cas Number 7721-01-9
    Ec Number 231-740-5
    Hazard Classification Corrosive

    As an accredited Tantalum Pentachloride factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing A sealed 100g amber glass bottle with tamper-evident cap, labeled "Tantalum Pentachloride, 99%, CAS 7721-01-9, moisture sensitive."
    Shipping Tantalum Pentachloride is shipped in tightly sealed containers made of materials resistant to corrosion, such as glass or PTFE-lined vessels, to prevent moisture ingress. It should be packed securely, clearly labeled as hazardous, and transported in accordance with international regulations for dangerous goods to ensure safety and compliance.
    Storage Tantalum pentachloride should be stored in tightly sealed containers made of glass or materials resistant to corrosion, in a cool, dry, and well-ventilated area. It must be kept away from moisture, water, and incompatible substances such as strong oxidizers. Storage conditions should prevent exposure to air and humidity, as it hydrolyzes easily, releasing toxic and corrosive hydrogen chloride gas.
    Application of Tantalum Pentachloride

    Applications of Tantalum Pentachloride in Industrial Manufacturing

    Tantalum pentachloride serves as a specialized intermediate in high-precision chemical engineering, electronics production, and advanced catalytic processes. As a direct manufacturer, we supply this material to select downstream sectors requiring consistent reactivity, traceable provenance, and specification-controlled supply for integrating into controlled process chains.

    1. Electronic-Grade Tantalum Capacitor Production

    Leading capacitor producers use tantalum pentachloride as a key source for the wet chemical synthesis of tantalum oxide powders. This compound enters the process after hydrolysis, where operational conditions like temperature, pH, and solvent load directly determine the surface area and purity of final tantalum oxide. Consistent precursor quality supports stringent dielectric property targets. Batch documentation and impurity control throughout conversion and calcination are critical for the reliability of downstream capacitor electrodes.

    Industry compliance standards

    • IEC 60384-1: Fixed Capacitors for Use in Electronic Equipment
    • JIS C5102: Tantalum Electrolytic Capacitors
    • RoHS Directive 2011/65/EU for hazardous substances
    • REACH Regulation (EC) No 1907/2006

    Typical usage ratio

    • 1.0–1.2 mol of pentachloride per mol Ta2O5 yield, adjusted for batch size and purity targets
    • Solvent and reactant ratios optimized based on throughput and downstream furnace specifications

    Downstream process integration

    • Added as a precursor in hydrolysis reactors post-dissolution
    • Controlled precipitation for high-purity Ta2O5 powder preparation
    • Subsequent filtration, calcination, and milling steps monitored for Cl-residue removal

    Final product types

    • Solid and chip tantalum capacitors
    • Electrolytic capacitor anode slugs
    • High-reliability SMD capacitors for telecom and automotive applications
    • Miniature high-capacitance components for medical electronics

    2. Sputtering Target Fabrication for Thin Film Deposition

    Producers of sputtering targets incorporate tantalum pentachloride as a chlorinated starting material for metallic tantalum powder generation. Reduction of the pentachloride yields high-purity metal, which technicians consolidate and process into dense targets for PVD systems. Strict feedstock traceability and uniformity support downstream physical vapor deposition lines making thin films for semiconductors, touch panels, and advanced coatings.

    Industry compliance standards

    • SEMI C70-0215: Specification for Tantalum Sputtering Targets
    • ISO 9001:2015 Quality Management for target fabrication
    • IEC 60068-2-45 for solderability in device manufacturing
    • RoHS and REACH substance monitoring

    Typical usage ratio

    • Pentachloride to reducing agent: 1:5–1:6 molar ratio (usually sodium or magnesium)
    • Batch charge tuned for target size, desired grain size, and collection yield

    Downstream process integration

    • Introduced in reduction reactors under inert atmosphere
    • Immediate processing to prevent oxidation and guarantee metallic cohesion
    • Pressed and sintered for controlled grain growth and density

    Final product types

    • Tantalum sputter targets for semiconductor logic and memory fabrication
    • Targets for diffusion barrier coatings on IC wafers
    • High-uniformity targets for optical and display coatings
    • Targets for mobile phone component metallization

    3. Chemical Vapor Deposition (CVD) Precursor for Superhard Coatings

    CVD process operators rely on tantalum pentachloride vapor-phase feedstock to deposit tantalum carbide and tantalum nitride coatings. This material’s high volatility and reactivity ensure controlled layer formation. Direct handling protocols and real-time monitoring systems prevent loss by hydrolysis. End-users demand traceable precursors, precise stoichiometry, and minimal residual halides to meet advanced tool and mold coating specifications.

    Industry compliance standards

    • ISO 20502: Hardness Testing of CVD Coatings
    • ANSI/NACE MR0175/ISO 15156 for corrosion-resistant coatings in oil and gas
    • Customer-specific process validation documentation
    • RoHS/REACH compliance for downstream application

    Typical usage ratio

    • Feed concentration: 0.2–1.0 g/L vapor stream, regulated by deposition rate and reactor size
    • Ratio adjusted based on partial pressure and co-reactant load (CH4, NH3, H2)

    Downstream process integration

    • Supplied to vapor delivery lines via heated bubblers or direct flash vaporization
    • Dosage synchronized with reactant flow and substrate movement
    • Monitored for chlorine residue in chamber and finished coating

    Final product types

    • TaC and TaN superhard coatings for cutting tools and dies
    • Wear and corrosion protective layers for chemical processing components
    • Precision mold inserts for plastic and glass injection
    • Plasma-resistant coatings for semiconductor etch hardware

    4. Organic Synthesis Catalyst for Pharmaceutical Intermediate Preparation

    Process chemists in the pharmaceutical sector select tantalum pentachloride as a Lewis acid catalyst for specific Friedel-Crafts and cyclization reactions. The compound’s halide function enables selective activation and rearrangement for heterocycle and intermediate molecule synthesis. Controlled introduction, order of addition, and moisture exclusion ensure efficient reaction kinetics and impurity minimization per multi-step GMP protocols. Each batch undergoes full audit traceability and meets process residue specifications for regulated drug synthesis chains.

    Industry compliance standards

    • ICH Q7 Good Manufacturing Practice for Active Pharmaceutical Ingredients
    • USP–NF General Chapter <1059> Excipient Performance
    • 21 CFR Part 211: Current Good Manufacturing Practice for Finished Pharmaceuticals
    • EMEA Guideline on Process Validation

    Typical usage ratio

    • 0.5–2.0 mol% relative to substrate, strictly controlled for catalytic efficiency and downstream extractability
    • Adjusted per substrate reactivity, solvent system, and scale of pharmaceutical intermediate synthesis

    Downstream process integration

    • Charged directly to sealed reactors at controlled temperatures under dry nitrogen
    • Reaction monitored for endpoint and residual halide content
    • Spent catalyst removed by phase separation or neutralization per regulatory guidance

    Final product types

    • API intermediates featuring substituted aromatic rings
    • Specialty heterocycles for oncology and anti-infective drugs
    • Chiral building blocks for small-molecule active drugs
    • Complex ligands for third-stage pharmaceutical synthesis

    5. Etchant and Patterning Agent for Semiconductor Microfabrication

    In IC manufacturing, cleanroom technicians use tantalum pentachloride as a component of specialty etch mixtures. This compound selectively removes tantalum layers in process steps for essential device patterning. The purity, controlled delivery, and volatility of the compound directly affect resolution and sidewall integrity in advanced node fabrication. Process engineers rigorously calibrate each etch bath or gas-phase delivery to avoid micro-contamination and dielectric etch selectivity loss. Waste handling and material recovery comply with facilities' strict chemical management programs.

    Industry compliance standards

    • SEMI S2: Environmental, Health, and Safety Guideline for Semiconductor Manufacturing Equipment
    • SEMI E49: Process Chemicals Purity Specification
    • Cleanroom ISO 14644-1: Classification of Air Cleanliness
    • RoHS/REACH compliance for device material flows

    Typical usage ratio

    • Etch bath loadings: 0.05–0.2 mol/L, modulated by total pattern depth and target removal rate
    • Gas-phase concentrations determined by tool type and generational process design

    Downstream process integration

    • Dosed in liquid etch baths for selective metal strip in patterning modules
    • Delivered as a vapor in controlled sub-atmospheric environments for plasma etch steps
    • Etch endpoint monitored by in situ reflectometry or mass spectrometry

    Final product types

    • High-density DRAM and NAND memory wafer stacks
    • Logic circuit patterns at 10 nm and below
    • 3D integrated devices requiring multi-level interconnect definition
    • Advanced sensors and MEMS devices

    6. Raw Material for Tantalum-based Superalloy Melting

    Superalloy producers utilize tantalum pentachloride as an additive source during the manufacture of high-performance nickel- and cobalt-based alloys. Its addition at defined points allows precise vanishing of tantalum and uniform distribution in the metal matrix upon reduction. Furnace charge calculations account for alloy target composition, minimizing off-stoichiometry and batch rejects. All supply lots conform to trace element and halide content controls aligning with downstream critical applications in aerospace and power generation sectors.

    Industry compliance standards

    • ASTM B365: Tantalum and Tantalum Alloy Ingots and Bars
    • AMS 2295: Tantalum for Superalloys
    • NADCAP Process Certification for Vacuum Induction Melting (VIM)
    • EN 9100: Aerospace Quality Management Systems

    Typical usage ratio

    • Added at 2–12 wt% relative to base alloy, based on target mechanical or thermal properties
    • Adjusted for expected reduction efficiency and recovery in alloy melt

    Downstream process integration

    • Introduced in pre-blended charges with other alloying elements before vacuum melting
    • Full mixing under controlled atmosphere to prevent contamination
    • Alloyed ingots or bars subsequently undergo multiple remelts and forming steps

    Final product types

    • Gas turbine blades and vanes
    • Turbine disks and combustion chamber liners
    • Aircraft engine rotating components
    • High-temperature mechanical fasteners for aerospace and industrial power plants
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    Certification & Compliance
    More Introduction

    Tantalum Pentachloride: Reliability and Precision from the Manufacturer’s Floor

    Decades at the Bench: Hands-On with Tantalum Pentachloride

    Every drum, every bottle of tantalum pentachloride that moves from our plant carries a story. As a manufacturer entrenched in the fine details of this compound, we have seen the ways small differences matter, both in the lab and on the factory line. Tantalum pentachloride, TaCl5, emerges each time from our reactors as a crystalline solid, stark white at the start, but housing tremendous reactivity under its neat appearance. Raw tantalum receives direct chlorination, and the resulting pentachloride—collected, rigorously purified, tested continuously for trace oxygen and moisture—forms the backbone for a family of specialized uses.

    Model and Specifications: Clarity Gates Results

    Tantalum pentachloride comes from our production in a standard specification sought by chemists and technologists who demand reliability and purity. Our batches maintain over 99.9% assay, judged by experienced analysts who understand that even a few ppm contaminants can derail sensitive synthesis. Water content sits well below 0.01%, because moisture leads to premature hydrolysis and release of corrosive HCl fumes. We routinely audit for metallic impurities, paying attention to tantalum oxychlorides, niobium, and transition metals, and act immediately if content edges over uncomfortably low thresholds. It’s clear to anyone running pilot or scale-up synthesis that the confidence in every run emerges from this vigilance at the early purification stage.

    How This Product Comes Together: Realities of the Shop Floor

    Turning tantalum metal to pentachloride seems straightforward from the outside, but our workers and engineers live through challenges that rarely show up in academic reviews. We operate under strict atmospheres, stripping out even the faintest water vapor. Every reactor, valve, and tube must stay pristine; a dusty glove or a leaky seal can set off violent hydrolysis, ruining whole batches. Chlorine feed rates, temperature ramps, residence time—the crew on shift balances each parameter with the patience and precision only repetition breeds. Chlorine leaks and off-specification metals, both lurking hazards, get checked with frequency that grows out of real-world mishaps, not just SOP instructions. For us, producing pure tantalum pentachloride isn’t about assembling a product—it’s the outcome of unbroken attention to every variable, large and small.

    Uses Born from Direct Experience

    Over the years, the list of real-life applications grows, followed by unexpected customer stories. Academics and materials scientists use our tantalum pentachloride as a high-purity precursor for chemical vapor deposition (CVD) and atomic layer deposition (ALD) of tantalum-containing thin films. Circuit manufacturers favor it in the production of high-performance capacitors, where even trace contamination can diminish yield. Across the chemical industry, it catalyzes or initiates reactions, handing chemists new organotantalum compounds with structures impossible to reach otherwise. Some customers rely on our expertise to dose minute quantities into special syntheses, confident that our batch consistency won’t throw off their delicate stoichiometry.

    For those who prepare catalysts or advanced electronic materials, repeatability matters as much as theoretical purity. Slightly mismatched impurity profiles lead to shifts in color, density, electrochemical properties, or surface structure—differences that never make it into a certificate of analysis but upend day-to-day production in a working plant. This is why our in-plant quality monitoring stretches beyond traditional assays, incorporating spectroscopic screens and collaborative feedback from R&D partners. In this business, relationships built over years with users of tantalum pentachloride result in process tweaks, tailored fills, and shipment timing shaped around evolving fabrication schedules.

    Real-World Handling: Convenience and Caution

    Every shipment ships in air-tight, moisture-resistant containers, ready to deliver value from the moment it lands at a customer’s lab or production line. Those who handle tantalum pentachloride daily know it fuses easily at modest temperatures and reacts with water vapor from the air, instantly triggering hydrolysis. That sharp, acrid HCl odor signals the need for care—a lesson hard learned by anyone who’s received a sweaty container or stored the product near a loading dock door in summer. We’ve adjusted packaging designs over time, replacing ordinary plastics and cardboard with sealed glass and lined stainless steel, based on lessons from real shipping mishaps and customer returns. Dry gloveboxes or controlled-atmosphere enclosures have become essential for transfers and dosing.

    Our technical support team routinely walks newer users through their first handling, offering tips: use a dry inert gas blanket, work quickly, avoid metal scoops, and always keep neutralizing solution and ventilation close by. It sounds basic, but years of troubleshooting customer issues have shown the value in repetition. Tantalum pentachloride’s combination of volatility, reactivity, and corrosivity makes it powerful, but only when matched with practical experience from shipment to storage to use.

    The Approach That Sets Our Tantalum Pentachloride Apart

    We see comparisons with other metal halides—niobium pentachloride comes up most often because of the chemical kinship. Yet, distinctions become clear on the factory floor. Where niobium pentachloride shows some similar reactivity, tantalum pentachloride offers greater thermal stability and a finer window of selectivity in synthetic chemistry. The two differ in volatility and in their ease of hydrolysis, details significant to anyone managing batch reactions sensitive to moisture or temperature swings. Past experience shows that substitutions, even when appealing on paper, often run into bottlenecks—yield drops, new impurities creep in, or downstream film morphology goes astray.

    A more striking comparison lies with other tantalum chemicals. Tantalum oxide or tantalum ethoxide, both familiar in electronics processing, lack the direct reactivity of pentachloride. In CVD and ALD, tantalum pentachloride enables coatings and features with sharp interfaces and controlled doping, opening doors to high-k dielectrics or advanced capacitor grades that oxide or carbonate precursors just can’t match. Certain organic transformations only take off when the unique reactivity of tantalum pentachloride is present—something we discovered firsthand in collaborative projects with research teams struggling with less aggressive tantalum sources.

    On-Purpose Manufacturing: Avoiding Hidden Pitfalls

    Producing tantalum pentachloride can’t rest on automation alone. We learn daily from edge cases—the odd batch that clogs, the valve that sticks, the shift when ambient humidity rises unnoticed. There’s never a completely quiet shift, and real expertise shows in how problems get solved before product leaves our dock. Every time a drum reaches a customer without incidents of caking, discoloration, or moisture breach, it’s not good luck—it’s the sum of daily, deliberate interventions by a skilled team.

    Customers with strict quality requirements often stop by our facility. Over coffee, detailed process records get pored over, not just certificates. Longstanding clients ask questions about batch-to-batch consistency or bring up problems from years past: a faint yellow tint under warehouse lights, a persistent trace of peroxide from a supplier’s chlorine fill, or a shipment that softened caps midway across the globe. Every discussion we have on-site, and every question we field over video calls, shapes the way we run our reactors and choose our packaging. No formula, no brochure, can replace the confidence built through this back-and-forth, and we value it in a way that shows up in today’s yields and tomorrow’s innovations.

    Traceability and Transparency

    Every lot of tantalum pentachloride carries a sharp paper trail—starting from raw tantalum bar, through every chlorination batch, every purification cycle, every analytical sign-off. We share this documentation freely with partners, wariness born from customers’ own regulatory and quality audits. Tantalum’s worldwide supply chain can raise stability concerns any day, so direct lines of sight, not vague upstream assurances, matter most to our buyers. When an issue emerges, it rarely waits for a quarterly review; instead, our technical and quality leads step into real-time problem-solving, whether tracking a minor shift in residue points, recalibrating gas flow sensors, or adjusting furnace profiles with the operations crew on a late shift.

    Supporting Advanced Industries: A Living Perspective

    The reach of tantalum pentachloride extends beyond traditional materials chemistry. Electronics giants designing cutting-edge memory or logic devices rely on the uniformity of tantalum films grown from pure pentachloride vapor. Multinational aerospace suppliers want predictably clean powders that serve as key building blocks in turbine blades or next-generation electronics. New markets keep pressing forward; those working on medical device coatings bring projects requiring even tighter impurity controls, and battery startups seek ever-stricter profiles for moisture and trace transition metals.

    This wave of progress can press the limits of specification sheets, demanding batch releases at breakneck speeds—sometimes within days. No matter how procedures tighten, each new requirement, each custom fill size, means conversations with the production floor, not just edits to an SOP. We’ve learned that flexibility only works if it rests on a foundation of disciplined core manufacturing and open dialogue between R&D, production, and end-users.

    Continuous Improvement from Both Sides

    We do not treat production as a static process. The most telling lessons land when customers try something new: a tweak in reactor pressure, a different deposition profile, a revised downstream purification. A sudden uptick in crystal size or a shift in flow properties at high throughput raises questions. Sometimes the answer lies in a minor tweaking in our fill or in a simple change in our packaging’s liner composition, other times in more fundamental process reevaluation that takes days of plant time. Shared risk and shared learning define every successful supply partnership.

    Over time, we’ve built ways for customers to transmit more detailed batch feedback directly to us. Instead of waiting for complaints, we analyze residue patterns, packaging deformation, venting incidents, and even color changes through photometric scans. The philosophy is simple: every unexpected blip gets tracked down. If a small anomaly in our plant determines a customer’s million-dollar yield loss weeks downstream, it’s our problem as much as theirs, and we treat it that way.

    The Human Touch in Manufacturing High-Purity Chemicals

    Looking back, the steady progress in our tantalum pentachloride product line rises from decades of hands-on experience, not automated routines or formulaic instructions. The crew who lifts the batches, logs the analyses, and manages the high-temperature reactors every day shape the end quality more than any machinery or laboratory instrumentation alone. Our best shifts run on lessons passed from veteran operators—how to watch for the faintest blue tint in a glass viewing port, how to adjust the nitrogen sweep by ear, how to smell for leaks with a quick whiff and a ready neutralizer in hand.

    Across industry, buyers often look for the lowest price or the fastest turnaround. Yet, many return to us after running into off-brand surprises—mistaken substitution with niobium formulations that fouled their lines, mislabeled drums with unexpected corrosion, or unacceptably wide batch-to-batch swings that force plant shutdowns. For them, our attention to detail and willingness to adjust process variables stems from a pragmatic belief: real value emerges from performance on the factory floor, in the pilot plant, and in the lab, not just from marketing copy or price lists.

    Navigating a Landscape in Flux

    The worldwide market for tantalum and its derivatives faces continual change. Geopolitical issues, upstream mineral supply hiccups, and new entrants from different regions each bring a fresh set of challenges. We know from hard experience that risk doesn’t vanish with big contracts or “preferred supplier” status—it moves, reshapes itself, and often lands with those most distant from the manufacturing floor. Each year’s stories from our clients include winners and heartbreaks: batches that saved a faltering product line, others derailed by subpar supply from a distributor chasing lower cost over accountability.

    Stability, speed, and trust—these grow from repeated cycles of direct manufacture, quality monitoring, and true-to-life feedback. For us, tantalum pentachloride is not just a chemical: it’s a series of choices and lessons, shaped every day by people who take pride in direct responsibility and the demands that working with real-world customers bring. No brochure, no standardized list of benefits, captures all the quirks, stories, and mid-shift adjustments that result in a product relied on worldwide, batch after batch, year after year.