Purity 99.9%: Silicon Tetrafluoride with 99.9% purity is used in high-purity silicon wafer manufacturing, where it ensures minimal contamination during the deposition process.

Molecular weight 104.08 g/mol: Silicon Tetrafluoride with molecular weight 104.08 g/mol is used in semiconductor etching applications, where it enables precise and uniform etch rates.

Gas phase stability up to 400°C: Silicon Tetrafluoride with gas phase stability up to 400°C is used in plasma-enhanced chemical vapor deposition, where it maintains consistent film formation at elevated temperatures.

Low moisture content < 5 ppm: Silicon Tetrafluoride with low moisture content below 5 ppm is used in optical fiber production, where it prevents hydrolysis and achieves high transmittance.

Cylinder pressure 1500 psi: Silicon Tetrafluoride at cylinder pressure of 1500 psi is used in specialty gas handling systems, where it ensures efficient delivery and process control.

Boiling point -86°C: Silicon Tetrafluoride with boiling point of -86°C is used in controlled atmosphere experiments, where its volatility allows for rapid gas phase transitions.

Particle-free grade: Silicon Tetrafluoride with particle-free grade is used in microelectronics fabrication, where it prevents particle-induced defects on device surfaces.

High solubility in water: Silicon Tetrafluoride with high solubility in water is used in laboratory synthesis of fluorosilicic acid, where it ensures high reaction yield and efficiency.