Purity 99.9%: Silicon Tetrachloride with purity 99.9% is used in optical fiber preform manufacturing, where it enables high-transparency glass formation.

Moisture content <50 ppm: Silicon Tetrachloride with moisture content <50 ppm is used in semiconductors fabrication, where it minimizes contamination during silicon dioxide deposition.

Boiling point 57.6°C: Silicon Tetrachloride with a boiling point of 57.6°C is used in the production of high-purity silicon, where it allows efficient vapor-phase chemical reactions.

Stability at ambient temperature: Silicon Tetrachloride with stability at ambient temperature is used in chemical intermediate processes, where it ensures consistent yield and safe handling.

Particle size <2 µm (aerosolized): Silicon Tetrachloride with particle size <2 µm is used in flame hydrolysis, where it creates uniform silica soot layers for precision applications.

Chloride content >99.5%: Silicon Tetrachloride with chloride content >99.5% is used in producing polysilicon for solar cells, where it enhances conversion efficiency during chemical vapor deposition.

Non-volatile residue <10 ppm: Silicon Tetrachloride with non-volatile residue <10 ppm is used in laboratory reagent synthesis, where it ensures high analytical accuracy.

Density 1.48 g/cm³: Silicon Tetrachloride with density 1.48 g/cm³ is used as a catalyst carrier, where it provides optimal dispersion in fluidized bed reactors.

Hydrolysis rate controlled at 20°C: Silicon Tetrachloride with a controlled hydrolysis rate at 20°C is used in synthesis of silica gels, where it allows precise pore structure formation.

Refractive index 1.398: Silicon Tetrachloride with a refractive index of 1.398 is used in specialized glassmaking, where it enables custom optical material properties.