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N-Ethylperfluorooctanesulfonamide

    • Product Name N-Ethylperfluorooctanesulfonamide
    • Alias NEtFOSA
    • Einecs 221-537-1
    • Mininmum Order 1 g
    • Factory Site Tengfei Creation Center,55 Jiangjun Avenue, Jiangning District,Nanjing
    • Price Inquiry admin@sinochem-nanjing.com
    • Manufacturer Sinochem Nanjing Corporation
    • CONTACT NOW
    Specifications

    HS Code

    853403

    Chemicalname N-Ethylperfluorooctanesulfonamide
    Casnumber 4151-50-2
    Molecularformula C10H6F17NO2S
    Molecularweight 499.20 g/mol
    Appearance White to off-white powder
    Meltingpoint 54-62°C
    Boilingpoint 196°C at 760 mmHg (decomposes)
    Solubility Insoluble in water, soluble in organic solvents
    Density 1.8 g/cm³ at 25°C
    Purity Typically >98%
    Synonyms N-Ethylperfluorooctanesulphonamide, N-EtFOSA
    Smiles CCNS(=O)(=O)C8F17
    Inchikey DZTPFZOSYUZILR-UHFFFAOYSA-N
    Flashpoint No data/information available
    Storageconditions Store at room temperature, keep container tightly closed

    As an accredited N-Ethylperfluorooctanesulfonamide factory, we enforce strict quality protocols—every batch undergoes rigorous testing to ensure consistent efficacy and safety standards.

    Packing & Storage
    Packing The chemical is packaged in a 100g amber glass bottle with a tightly sealed cap, labeled with safety warnings and product identification.
    Shipping N-Ethylperfluorooctanesulfonamide should be shipped in tightly sealed, chemical-resistant containers, clearly labeled, and stored in a cool, dry, well-ventilated area. Comply with all local, national, and international regulations for hazardous materials transport. Avoid exposure to heat, moisture, and incompatible substances to ensure safe handling and delivery.
    Storage N-Ethylperfluorooctanesulfonamide should be stored in a cool, dry, well-ventilated area away from incompatible substances such as strong oxidizers. Keep the container tightly closed and properly labeled. Avoid exposure to moisture and sources of ignition. Store in a dedicated chemical storage cabinet designed for hazardous materials to prevent environmental contamination and ensure personal safety.
    Application of N-Ethylperfluorooctanesulfonamide

    Purity 98%: N-Ethylperfluorooctanesulfonamide with 98% purity is used in the synthesis of water-repellent coatings, where it delivers optimal hydrophobic surface modification.

    Molecular Weight 521 g/mol: N-Ethylperfluorooctanesulfonamide with a molecular weight of 521 g/mol is used in the formulation of flame retardants, where it provides enhanced thermal stability.

    Melting Point 55°C: N-Ethylperfluorooctanesulfonamide with a melting point of 55°C is used in specialty polymer processing, where it allows for uniform mixing and dispersion.

    Stability Temperature 200°C: N-Ethylperfluorooctanesulfonamide with a stability temperature of 200°C is used in high-temperature lubricants, where it maintains low volatility and chemical integrity.

    Particle Size <10 μm: N-Ethylperfluorooctanesulfonamide with particle size below 10 μm is used in electronic encapsulants, where it ensures smooth film formation and particle uniformity.

    Viscosity Grade Low: N-Ethylperfluorooctanesulfonamide of low viscosity grade is used in surface treatment agents, where it enables efficient substrate wetting and coverage.

    Acid Value <1 mg KOH/g: N-Ethylperfluorooctanesulfonamide with acid value less than 1 mg KOH/g is used in textile finishing, where it minimizes substrate degradation and enhances fabric longevity.

    Hydrophobicity >110° Contact Angle: N-Ethylperfluorooctanesulfonamide achieving greater than 110° contact angle is used in protective coatings, where it imparts strong water repellency.

    Chemical Stability pH 2–12: N-Ethylperfluorooctanesulfonamide stable in pH 2–12 is used in industrial cleaning agents, where it ensures reliable performance across variable acidic and basic conditions.

    Thermal Decomposition >300°C: N-Ethylperfluorooctanesulfonamide with thermal decomposition above 300°C is used in photolithography resists, where it provides excellent process durability at elevated temperatures.

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