Purity 99%: Arsenic Trifluoride with purity 99% is used in the synthesis of organoarsenic compounds, where it ensures high product yield and minimal impurities.

Melting Point 55°C: Arsenic Trifluoride with a melting point of 55°C is used in fluorination reactions, where it enables efficient halogen exchange at controlled temperatures.

Density 3.87 g/cm³: Arsenic Trifluoride with density 3.87 g/cm³ is used in high-density chemical vapor deposition processes, where it provides uniform film formation.

Stability Temperature 100°C: Arsenic Trifluoride with stability up to 100°C is used in selective etching applications, where it maintains chemical integrity under process conditions.

Molecular Weight 131.94 g/mol: Arsenic Trifluoride with molecular weight 131.94 g/mol is used in specialty glass manufacturing, where precise stoichiometry enhances product performance.

Particle Size <10 µm: Arsenic Trifluoride with particle size less than 10 µm is used in fine chemical synthesis, where it ensures rapid dissolution and homogeneous mixing.

Analytical Reagent Grade: Arsenic Trifluoride of analytical reagent grade is used in laboratory fluorination assays, where its high specification guarantees reproducible analytical results.

Low Water Content <0.01%: Arsenic Trifluoride with water content less than 0.01% is used in moisture-sensitive catalysis, where it prevents unwanted hydrolysis reactions.

Gas Phase Purity 99.5%: Arsenic Trifluoride with gas phase purity 99.5% is used in semiconductor etching, where it delivers high selectivity and consistent etch rates.

Corrosivity Index Low: Arsenic Trifluoride with a low corrosivity index is used in precision instrumentation cleaning, where it minimizes equipment degradation.