Purity 99.5%: 1,1,2-Trichloro-1,2,2-Trifluoroethane with purity 99.5% is used in precision electronics cleaning, where it ensures optimal removal of particulate and ionic contaminants.

Boiling Point 55°C: 1,1,2-Trichloro-1,2,2-Trifluoroethane with a boiling point of 55°C is employed in closed-circuit refrigeration systems, where it supports efficient heat transfer cycles.

Low Water Content (<0.01%): 1,1,2-Trichloro-1,2,2-Trifluoroethane with low water content (<0.01%) is utilized in pharmaceutical intermediate synthesis, where it prevents moisture-induced degradation of sensitive compounds.

Stability Temperature up to 120°C: 1,1,2-Trichloro-1,2,2-Trifluoroethane stable up to 120°C is applied in precision metal degreasing, where it maintains solvent efficacy under thermal stress.

Viscosity 0.65 mPa·s at 25°C: 1,1,2-Trichloro-1,2,2-Trifluoroethane with viscosity 0.65 mPa·s at 25°C is used in aerosol formulations, where it achieves uniform dispersion of active ingredients.

Low Residue: 1,1,2-Trichloro-1,2,2-Trifluoroethane with low residue property is used in optical component cleaning, where it minimizes film formation on lenses and mirrors.

High Dielectric Strength: 1,1,2-Trichloro-1,2,2-Trifluoroethane with high dielectric strength is utilized in transformer maintenance, where it provides safe and effective insulation cleaning.

Density 1.56 g/cm³: 1,1,2-Trichloro-1,2,2-Trifluoroethane with density 1.56 g/cm³ is used in centrifugal separation processes, where it enhances phase differentiation.